Molecular depth profiling with reactive ions, or why chemistry matters in sputtering
2010 ◽
Vol 43
(1-2)
◽
pp. 146-150
◽
2010 ◽
Vol 42
(8)
◽
pp. 1402-1408
◽
2008 ◽
Vol 255
(4)
◽
pp. 831-833
◽
Keyword(s):
2007 ◽
Vol 18
(3)
◽
pp. 406-412
◽
2008 ◽
Vol 255
(4)
◽
pp. 959-961
◽
2010 ◽
Vol 42
(10-11)
◽
pp. 1612-1615
◽