Scanning force microscopy and amplitude versus distance measurements on single-crystal oxide surfaces

2004 ◽  
Vol 36 (3) ◽  
pp. 213-219 ◽  
Author(s):  
Suwarna Datar ◽  
Shivprasad Patil ◽  
S. B. Iyyer ◽  
C. V. Dharmadhikari
1996 ◽  
Vol 80 (5) ◽  
pp. 2680-2686 ◽  
Author(s):  
Nam‐Seok Park ◽  
Myoung‐Won Kim ◽  
S. C. Langford ◽  
J. T. Dickinson

2005 ◽  
Vol 86 (13) ◽  
pp. 134101 ◽  
Author(s):  
J. L. Yang ◽  
M. Despont ◽  
U. Drechsler ◽  
B. W. Hoogenboom ◽  
P. L. T. M. Frederix ◽  
...  

2003 ◽  
Vol 48 (13) ◽  
pp. 1386-1389
Author(s):  
Huarong Zeng ◽  
Qingrui Yin ◽  
Guorong Li ◽  
Haosu Luo ◽  
Zhenkui Xu

1998 ◽  
Vol 13 (10) ◽  
pp. 2791-2799 ◽  
Author(s):  
D. S. Linehan ◽  
E. P. Kvam ◽  
L. Hou ◽  
M. W. McElfresh

Films of Yba2Cu3O7−δ (YBCO) were grown on (001), exact and vicinal (110), and (111) SrTiO3 single crystal substrates by pulsed laser deposition, and evaluated by x-ray diffraction and scanning force microscopy (AFM). It was observed that the YBCO was always epitaxially aligned to the substrate with the [001] (c-axis) parallel to a substrate cube axis direction. For the exact (001), (110), and (111) surfaces, there were one, two, and three orientations, respectively. For the vicinal (110) surfaces, however, there was usually only one discernible c-axis orientation, corresponding to a single {013} film surface orientation. The reduction of the (110) surface twofold symmetry by use of a vicinal substrate thus allowed controlled growth of a YBCO single crystal with an inclined c-axis orientation.


Author(s):  
Chang Shen ◽  
Phil Fraundorf ◽  
Robert W. Harrick

Monolithic integration of optoelectronic integrated circuits (OEIC) requires high quantity etched laser facets which prevent the developing of more-highly-integrated OEIC's. The causes of facet roughness are not well understood, and improvement of facet quality is hampered by the difficulty in measuring the surface roughness. There are several approaches to examining facet roughness qualitatively, such as scanning force microscopy (SFM), scanning tunneling microscopy (STM) and scanning electron microscopy (SEM). The challenge here is to allow more straightforward monitoring of deep vertical etched facets, without the need to cleave out test samples. In this presentation, we show air based STM and SFM images of vertical dry-etched laser facets, and discuss the image acquisition and roughness measurement processes. Our technique does not require precision cleaving. We use a traditional tip instead of the T shape tip used elsewhere to preventing “shower curtain” profiling of the sidewall. We tilt the sample about 30 to 50 degrees to avoid the curtain effect.


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