2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)

Y-Function Based Methodology for Accurate Statistical Extraction of HEMT Device Parameters for GaN Technology

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365637 ◽

2020 ◽

Author(s):

Romeo Kom Kammeugne ◽

Charles Leroux ◽

Jacques Cluzel ◽

Laura Vauche ◽

Cyrille Le Royer ◽

...

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Impact of Channel Implant Variation on RTN and Flicker Noise

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365296 ◽

2020 ◽

Author(s):

Yannick Raffel ◽

Konrad Seidel ◽

Luca Pirro ◽

Steffen Lehmann ◽

Raik Hoffmann ◽

...

Keyword(s):

Flicker Noise

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Optimization of the Dual-Technology Back-Enhanced Field Effect Transistor

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365305 ◽

2020 ◽

Author(s):

C. A. B. Mori ◽

P. G. D. Agopian ◽

J. A. Martino

Keyword(s):

Field Effect ◽

Field Effect Transistor ◽

Effect Transistor

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New embedded resistance/ gated diode on thin film silicon BIMOS device for advanced ESD protection in FD-SOI technology

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365396 ◽

2020 ◽

Author(s):

Ph. Galy ◽

G. Delahaye ◽

L. Anghel

Keyword(s):

Thin Film ◽

Thin Film Silicon ◽

Esd Protection ◽

Soi Technology

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CVD-grown back-gated MoS2 transistors

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365295 ◽

2020 ◽

Author(s):

Carlos Marquez ◽

Norberto Salazar ◽

Farzan Gity ◽

Carlos Navarro ◽

Gioele Mirabelli ◽

...

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Efficient Implementation of S/D tunneling in 2D MS-EMC of Nanoelectronic Devices Including the Thickness Dependent Effective Mass

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365606 ◽

2020 ◽

Author(s):

Cristina Medina-Bailon ◽

Carlos Sampedro ◽

Hamilton Carrillo-Nunez ◽

Jaehyun Lee ◽

Jose Luis Padilla ◽

...

Keyword(s):

Effective Mass ◽

Efficient Implementation ◽

Nanoelectronic Devices

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Phase transformation in ALD hafnia based layers for silicon-on-ferroelectric devices

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365298 ◽

2020 ◽

Author(s):

Andrey Miakonkikh ◽

Andrey Lomov ◽

Alexander Rogozhin ◽

Konstantin Rudenko ◽

Vladimir Lukichev ◽

...

Keyword(s):

Phase Transformation

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Revisited parasitic bipolar effect in FDSOI MOSFETs: mechanism, gain extraction and circuit applications

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365391 ◽

2020 ◽

Author(s):

GQ. Wang ◽

FY. Liu ◽

B. Li ◽

JJ. Luo ◽

Y. Huang ◽

...

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Characteristic C - V profile as a signature for electrostatic doping in FD-SOI

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365304 ◽

2020 ◽

Author(s):

Gaurav Gupta ◽

Raymond J.E. Hueting

Keyword(s):

Electrostatic Doping

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Contacts between CMOS circuits and cell membrane by silicon nanowires

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) ◽

10.1109/eurosoi-ulis49407.2020.9365351 ◽

2020 ◽

Author(s):

G. Galderisi ◽

D.A.M. Feyen ◽

R. Gaetani ◽

M. Mercola ◽

E. Messina ◽

...

Keyword(s):

Cell Membrane ◽

Silicon Nanowires ◽

Cmos Circuits

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2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)
Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Y-Function Based Methodology for Accurate Statistical Extraction of HEMT Device Parameters for GaN Technology

Impact of Channel Implant Variation on RTN and Flicker Noise

Optimization of the Dual-Technology Back-Enhanced Field Effect Transistor

New embedded resistance/ gated diode on thin film silicon BIMOS device for advanced ESD protection in FD-SOI technology

CVD-grown back-gated MoS2 transistors

Efficient Implementation of S/D tunneling in 2D MS-EMC of Nanoelectronic Devices Including the Thickness Dependent Effective Mass

Phase transformation in ALD hafnia based layers for silicon-on-ferroelectric devices

Revisited parasitic bipolar effect in FDSOI MOSFETs: mechanism, gain extraction and circuit applications

Characteristic C - V profile as a signature for electrostatic doping in FD-SOI

Contacts between CMOS circuits and cell membrane by silicon nanowires

Export Citation Format

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Y-Function Based Methodology for Accurate Statistical Extraction of HEMT Device Parameters for GaN Technology

Impact of Channel Implant Variation on RTN and Flicker Noise

Optimization of the Dual-Technology Back-Enhanced Field Effect Transistor

New embedded resistance/ gated diode on thin film silicon BIMOS device for advanced ESD protection in FD-SOI technology

CVD-grown back-gated MoS2 transistors

Efficient Implementation of S/D tunneling in 2D MS-EMC of Nanoelectronic Devices Including the Thickness Dependent Effective Mass

Phase transformation in ALD hafnia based layers for silicon-on-ferroelectric devices

Revisited parasitic bipolar effect in FDSOI MOSFETs: mechanism, gain extraction and circuit applications

Characteristic C - V profile as a signature for electrostatic doping in FD-SOI

Contacts between CMOS circuits and cell membrane by silicon nanowires

2020 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)
Latest Publications