The Role of Metallic Impurities in the Field-Enhanced Carrier Generation in MOS Structures

1996 ◽  
Vol 154 (2) ◽  
pp. 599-605 ◽  
Author(s):  
P. Peykov ◽  
T. Diaz ◽  
H. Juárez ◽  
R. Castanedo
Keyword(s):  
Carrier Generation ◽  
Mos Structures ◽  
Metallic Impurities

The role of HCl in the passivation of MOS structures

1972 ◽  
Vol 13 (1) ◽  
pp. 11-14 ◽  
Author(s):  
R.J. Kriegler
Keyword(s):  
Mos Structures

The Role of Chlorine in the Gettering of Metallic Impurities from Silicon

1985 ◽  
Vol 132 (8) ◽  
pp. 2031-2033 ◽  
Author(s):  
Thomas A. Baginski ◽  
Joseph R. Monkowski
Keyword(s):  
Metallic Impurities

scholarly journals Optimizing the role of impact ionization in conventional insulators

2019 ◽  
Vol 9 (1) ◽  
Author(s):  
Efstratios Manousakis
Keyword(s):  
Energy Distribution ◽  
Fermi Level ◽  
Impact Ionization ◽  
Strongly Correlated ◽  
Carrier Generation ◽  
Efficient Separation ◽  
Photovoltaic Efficiency ◽  
Halide Perovskites ◽  
Photon Energy Distribution

AbstractA mechanism for multiple carrier generation through impact ionization (IA) proposed earlier for bulk systems of strongly correlated insulators is generalized to the case of conventional insulators that contain localized bands a few eV above and below the highest occupied band. Specifically, we study the case of hybridization of localized orbitals with more dispersive bands near the Fermi level, where the generated multiple carriers, which ultimately decay to the edges of the dispersive bands by means of IA processes, acquire lighter mass and this could allow their more efficient separation before recombination. We argue that this may be applicable to the case of halide perovskites and it could be one of the reasons for their observed photovoltaic efficiency. We discuss the criteria one should use to uncover the appropriate material in order to harvest the optimum effect of IA for the spectrum of the solar photon energy distribution.

On the role of chlorine in the passivation of MOS structures

1979 ◽  
Vol 53 (2) ◽  
pp. 659-664 ◽  
Author(s):  
W. Wroński
Keyword(s):  
Mos Structures
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