Room‐Temperature Ni Interaction with Deformation‐Induced Defects in Si: A DLTS Study

2019 ◽  
Vol 216 (17) ◽  
pp. 1900326
Author(s):  
Oleg A. Soltanovich ◽  
Valery I. Orlov ◽  
Nikolai Yarykin ◽  
Eugene B. Yakimov
Keyword(s):  
Room Temperature ◽  
Induced Defects

scholarly journals MINIMAL VARIATION OF DEFECT STRUCTURE DUE TO THE ORDER OF ROOM TEMPERATURE HYDROGEN ISOTOPE IMPLANTATION AND SELF-ION IRRADIATION IN NICKEL

MRS Advances ◽  
2016 ◽  
Vol 1 (42) ◽  
pp. 2887-2892
Author(s):  
Brittany Muntifering ◽  
Jianmin Qu ◽  
Khalid Hattar
Keyword(s):  
Dislocation Loop ◽  
Hydrogen Isotope ◽  
Room Temperature ◽  
Ion Irradiation ◽  
In Situ Tem ◽  
Loop Formation ◽  
Radiation Induced ◽  
Formation And Evolution ◽  
And Performance ◽  
Induced Defects

ABSTRACTThe formation and stability of radiation-induced defects in structural materials in reactor environments significantly effects their integrity and performance. Hydrogen, which may be present in significant quantities in future reactors, may play an important role in defect evolution. To characterize the effect of hydrogen on cascade damage evolution, in-situ TEM self-ion irradiation and deuterium implantation was performed, both sequentially and concurrently, on nickel. This paper presents preliminary results characterizing dislocation loop formation and evolution during room temperature deuterium implantation and self-ion irradiation and the consequence of the sequence of irradiation. Hydrogen isotope implantation at room temperature appears to have little or no effect on the final dislocation loop structures that result from self-ion irradiation, regardless of the sequence of irradiation. Tilting experiments emphasize the importance of precise two-beam conditions for characterizing defect size and structure.

scholarly journals The Deformation Behavior and Bending Emissions of ZnO Microwire Affected by Deformation-Induced Defects and Thermal Tunneling Effect

Sensors ◽  
2021 ◽  
Vol 21 (17) ◽  
pp. 5887
Author(s):  
Linlin Shi ◽  
Hong Wang ◽  
Xiaohui Ma ◽  
Yunpeng Wang ◽  
Fei Wang ◽  
...  
Keyword(s):  
Room Temperature ◽  
Luminescent Properties ◽  
Tunneling Effect ◽  
Light Sources ◽  
Electrical Characteristics ◽  
Fundamental Research ◽  
Induced Defects ◽  
Theoretical Simulations ◽  
Bright Emission

The realization of electrically pumped emitters at micro and nanoscale, especially with flexibility or special shapes is still a goal for prospective fundamental research and application. Herein, zinc oxide (ZnO) microwires were produced to investigate the luminescent properties affected by stress. To exploit the initial stress, room temperature in situ elastic bending stress was applied on the microwires by squeezing between the two approaching electrodes. A novel unrecoverable deformation phenomenon was observed by applying a large enough voltage, resulting in the formation of additional defects at bent regions. The electrical characteristics of the microwire changed with the applied bending deformation due to the introduction of defects by stress. When the injection current exceeded certain values, bright emission was observed at bent regions, ZnO microwires showed illumination at the bent region priority to straight region. The bent emission can be attributed to the effect of thermal tunneling electroluminescence appeared primarily at bent regions. The physical mechanism of the observed thermoluminescence phenomena was analyzed using theoretical simulations. The realization of electrically induced deformation and the related bending emissions in single microwires shows the possibility to fabricate special-shaped light sources and offer a method to develop photoelectronic devices.

Control of and Mechanisms for Room Temperature Visible light Emission from Silicon Nanostructures in SiO2 formed by Si+ Ion Implantation

1994 ◽  
Vol 358 ◽  
Author(s):  
T. Komoda ◽  
J.P. Kelly ◽  
A. Nejm ◽  
K.P. Homewood ◽  
P.L.F Hemment ◽  
...  
Keyword(s):  
Quantum Confinement ◽  
Room Temperature ◽  
Light Emission ◽  
Silicon Nanostructures ◽  
Two Phase ◽  
Population Distributions ◽  
Si Nanocrystals ◽  
Induced Defects ◽  
Irradiation Induced Defects ◽  
Si Ion Implantation

ABSTRACTImplantation of Si+ ions into thermal oxides grown on silicon has been used to synthesise a two phase structure consisting of Si nanocrystals in a SiO2 matrix. Various processing conditions have been used in order to modify the size and population distributions of the Si inclusions. Photoluminescence spectra have been recorded from samples annealed in nitrogen, forming gas and oxygen. Both red and blue shifts of the luminescence peaks have been observed. It is concluded that the photoluminescence is a consequence of the effects of quantum confinement but is also dependent on the presence of irradiation-induced defects or Si/SiO2 interface states.

Passivation of Ion-Beam-Induced Defects at and Around the Si-SiO2 Interface by Ion Beam Hydrogenation

1992 ◽  
Vol 262 ◽  
Author(s):  
S. Kar ◽  
K. Srikanth ◽  
S. Ashok
Keyword(s):  
Metal Oxide ◽  
Room Temperature ◽  
Ion Beam ◽  
Oxide Thickness ◽  
Hydrogen Ion ◽  
Frequency Measurements ◽  
Silicon Structures ◽  
Voltage Frequency ◽  
Electronic Defects ◽  
Induced Defects

ABSTRACTElectronic defects were introduced at and around the Si-SiO2 interface by exposing thermally-oxidized silicon samples to a 16 keV Si ion beam in an ion implanter. The oxide thickness was 350 Å. Following Si self-implantation, hydrogenation was carried out at room temperature by a 400 eV hydrogen ion beam from a Kaufman source. Experimental results obtained from the admittance-voltage-frequency measurements of the metal-oxide-silicon structures indicated significant passivation of the ion-beam-induced defects.

Reverse martensitic phase transformation induced in Nb–Co multilayers by ion irradiation

1994 ◽  
Vol 9 (2) ◽  
pp. 357-361 ◽  
Author(s):  
B.X. Liu ◽  
Z.J. Zhang
Keyword(s):  
Phase Transformation ◽  
High Temperature ◽  
Solid State ◽  
Room Temperature ◽  
Ion Irradiation ◽  
Martensitic Phase ◽  
Martensitic Phase Transformation ◽  
Step Transition ◽  
Induced Defects ◽  
Irradiation Induced Defects

A reverse martensitic phase transformation was observed in Nb-enriched Nb-Co multilayers induced by room temperature 200 ke V xenon ion mixing. Further experiments revealed that this bcc-fcc transition proceeds in two steps, i.e., bcc-hcp and hcp-fcc. A crystallographic model is proposed to explain the two-step transition through shearing and sliding, which are mediated by irradiation-induced defects and strain in the films. In addition, the existence of the hcp and fcc metastable states in the Nb-Co system was confirmed by high-temperature solid state interdiffusion of the corresponding multilayers.

scholarly journals Fast recovery of ion-irradiation-induced defects in Ge₂Sb₂Te₅ thin films at room temperature

2021 ◽  
Author(s):  
Martin Hafermann ◽  
Robin Schock ◽  
Chenghao Wan ◽  
Jura Rensberg ◽  
Mikhail Kats ◽  
...  
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Ion Irradiation ◽  
Fast Recovery ◽  
Induced Defects ◽  
Irradiation Induced Defects

Radiation induced defects in silicon at room temperature

1980 ◽  
Vol 58 (1) ◽  
pp. K1-K3 ◽  
Author(s):  
M. Pasemann ◽  
P. Werner
Keyword(s):  
Room Temperature ◽  
Radiation Induced ◽  
Induced Defects

Evolution of D0 and non-D0 Light Induced Defect States in a-Si:H Materials and Their Respective Contribution to Carrier Recombination

2004 ◽  
Vol 808 ◽  
Author(s):  
J. M. Pearce ◽  
J. Deng ◽  
V. Vlahos ◽  
R. W. Collins ◽  
C. R. Wronski ◽  
...  
Keyword(s):  
Room Temperature ◽  
Defect States ◽  
Carrier Recombination ◽  
Spin Resonance ◽  
Respective Contribution ◽  
Gap States ◽  
Induced Changes ◽  
Induced Defects ◽  
Kinetics Of ◽  
Absorption Measurements

A study has been carried out on the evolution of light induced defects in protocrystalline (diluted) a-Si:H films under 1 sun illumination. A room temperature reversal is observed in the photocurrents at 25°C, which is consistent with the relaxation in the recombination currents on corresponding p-i-n solar cells. It is also consistent with the pressure of “fast” states such as have been observed after high intensity illumination. Even with the limitations imposed by the relaxation in the light induced changes on the subgap absorption measurements, the evolution of distinctly different gap states centered around 0.9 and 1.15eV from the conduction band was identified. The kinetics of the electron occupied states, kN(E), at these two energies is compared with that of the neutral dangling bond (D0) densities as measured with electron spin resonance. Because of the similarity between the preliminary results of these kinetics it has not been possible to identify which states correspond to the D0 nor to draw any reliable conclusions about the nature of the different states.

High energy oxygen irradiation-induced defects in Fe-doped semi-insulating indium phosphide by positron annihilation technique

2017 ◽  
Vol 31 (04) ◽  
pp. 1750019
Author(s):  
S. Pan ◽  
A. Mandal ◽  
Md. A. Sohel ◽  
A. K. Saha ◽  
D. Das ◽  
...  
Keyword(s):  
Indium Phosphide ◽  
Positron Annihilation ◽  
Room Temperature ◽  
High Energy ◽  
Average Lifetime ◽  
Defect States ◽  
Positron Trapping ◽  
Radiation Induced ◽  
Induced Defects ◽  
Irradiation Induced Defects

Positron annihilation technique is applied to study the recovery of radiation-induced defects in 140 MeV oxygen (O[Formula: see text]) irradiated Fe-doped semi-insulating indium phosphide during annealing over a temperature region of 25[Formula: see text]C–650[Formula: see text]C. Lifetime spectra of the irradiated sample are fitted with three lifetime components. Trapping model analysis is used to characterize defect states corresponding to the de-convoluted lifetime values. After irradiation, the observed average lifetime of positron [Formula: see text] ps at room temperature is higher than the bulk lifetime by 21 ps which reveals the presence of radiation-induced defects in the material. A decrease in [Formula: see text] occurs during room temperature 25[Formula: see text]C to 200[Formula: see text]C indicating the dissociation of higher order defects, might be due to positron trapping in acceptor-type of defects ([Formula: see text]). A reverse annealing stage is found at temperature range of 250[Formula: see text]C–425[Formula: see text]C for [Formula: see text]-parameter probably due to the migration of vacancies and the formation of vacancy clusters. Increase in [Formula: see text]-parameter from 325[Formula: see text]C to 425[Formula: see text]C indicates the change in the nature of predominant positron trapping sites. Beyond 425[Formula: see text]C, [Formula: see text], [Formula: see text]-parameter and [Formula: see text]-parameter starts decreasing and around 650[Formula: see text]C, [Formula: see text] and [Formula: see text]-parameter approached almost the bulk value showing the annealing out of radiation-induced defects.

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