A Novel Organosilicon Source for Low Temperature Plasma Deposition of Silicon Nitride-like Thin Films

2005 ◽  
Vol 2 (8) ◽  
pp. 612-617 ◽  
Author(s):  
Rosa Di Mundo ◽  
Riccardo d'Agostino ◽  
Francesco Fracassi ◽  
Fabio Palumbo
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Low Temperature ◽  
Plasma Deposition ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Low-Temperature Plasma Deposition of Diamond-Like Carbon and III Nitride Thin-Films for Photovoltaic Devices

2009 ◽  
Vol 610-613 ◽  
pp. 353-356
Author(s):  
Jin She Yuan ◽  
Ming Yue Wang ◽  
Guo Hao Yu
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Plasma Deposition ◽  
Diamond Like Carbon ◽  
Low Temperature Plasma ◽  
Photovoltaic Devices ◽  
Temperature Plasma ◽  
Force Microscopy ◽  
Atomic Force ◽  
Gan Film

Low-temperature plasma deposition of diamond-like carbon (DLC) and gallium nitride thin-films grown on Si substrate by PECVD was investigated using atomic force microscopy and reflectance spectra for photovoltaic devices application. It was found that the morphological features of the GaN film depend on the substrates under the optimum deposition conditions. The optical band gap of the films was approximately 5.5eV for PECVD DLC and approximately 3.3 eV for PECVD GaN.

Chemical structure of low-temperature plasma-deposited silicon nitride thin films

2004 ◽  
Author(s):  
Martin T. Soh ◽  
Nick Savvides ◽  
Charles A. Musca ◽  
John M. Dell ◽  
Lorenzo Faraone
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Low Temperature ◽  
Chemical Structure ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Stress in low-temperature plasma enhanced chemical vapour deposited silicon nitride thin films

2005 ◽  
Vol 15 (1) ◽  
pp. S29-S38 ◽  
Author(s):  
M Martyniuk ◽  
J Antoszewski ◽  
C A Musca ◽  
J M Dell ◽  
L Faraone
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Low Temperature ◽  
Chemical Vapour ◽  
Low Temperature Plasma ◽  
Temperature Plasma
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