Control of all-conjugated block copolymer crystallization via thermal and solvent annealing

2014 ◽  
Vol 52 (13) ◽  
pp. 900-906 ◽  
Author(s):  
Kendall A. Smith ◽  
Bridget Stewart ◽  
Kevin G. Yager ◽  
Joseph Strzalka ◽  
Rafael Verduzco
Keyword(s):  
Block Copolymer ◽  
Solvent Annealing

Controlling the ordered transition of PS-b-P4VP block copolymer ultrathin films by solvent annealing

2020 ◽  
Vol 239 ◽  
pp. 122072
Author(s):  
Yang Wang ◽  
Chieko Narita ◽  
Xinhe Xu ◽  
Hidekazu Honma ◽  
Yuki Himeda ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Ultrathin Films ◽  
Solvent Annealing

scholarly journals Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

Nano Letters ◽  
2011 ◽  
Vol 11 (11) ◽  
pp. 5079-5084 ◽  
Author(s):  
Jeong Gon Son ◽  
Jae-Byum Chang ◽  
Karl K. Berggren ◽  
Caroline A. Ross
Keyword(s):  
Block Copolymer ◽  
Electron Irradiation ◽  
Solvent Annealing

scholarly journals Microphase Separation of a PS-b-PFS Block CopolymerviaSolvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

2015 ◽  
Vol 2015 ◽  
pp. 1-10
Author(s):  
Colm T. O’Mahony ◽  
Dipu Borah ◽  
Michael A. Morris
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Microphase Separation ◽  
Annealing Effect ◽  
Solvent Annealing ◽  
Spin Casting ◽  
Effect Of Solvent ◽  
Ordered Arrays ◽  
Annealing Conditions ◽  
Nanoscale Features

Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.

Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM

2006 ◽  
Vol 532-533 ◽  
pp. 165-168
Author(s):  
Yong Zhi Cao ◽  
Shen Dong ◽  
Ying Chun Liang ◽  
Tao Sun
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Triblock Copolymer ◽  
Low Cost ◽  
Orientational Order ◽  
Solvent Annealing ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ordered Nanostructures ◽  
Self Assembled

As a “bottom-up” approach to nanostructures for nanofabrication, self-assembled block copolymer thin films have received much attention not only thanks to the scale of the microdomains but also due to the convenient shape tunability. In order to realize applications of self-assembled block copolymer thin films in nanotechnologies, control over microdomain spatial and orientational order is paramount. In this paper, using atomic force microscopy (AFM), we studied systemically nanostructure transitions induced by post-solvent annealing in self-assembled block copolymer thin films. Furthermore, a variety of thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies, have been realized simply and at low cost.

scholarly journals UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films

2016 ◽  
Vol 27 (46) ◽  
pp. 465301 ◽  
Author(s):  
Keehong Lee ◽  
Melissa Kreider ◽  
Wubin Bai ◽  
Li-Chen Cheng ◽  
Saman Safari Dinachali ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Solvent Annealing ◽  
Copolymer Films
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