scholarly journals Microphase Separation of a PS-b-PFS Block CopolymerviaSolvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

2015 ◽  
Vol 2015 ◽  
pp. 1-10
Author(s):  
Colm T. O’Mahony ◽  
Dipu Borah ◽  
Michael A. Morris
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Microphase Separation ◽  
Annealing Effect ◽  
Solvent Annealing ◽  
Spin Casting ◽  
Effect Of Solvent ◽  
Ordered Arrays ◽  
Annealing Conditions ◽  
Nanoscale Features

Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.

Block Copolymers: Thermodynamics, Dynamics, and Small-Angle Scattering

2015 ◽  
Author(s):  
Lee M. Trask ◽  
Nacu Hernandez ◽  
Eric W. Cochran
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Small Angle ◽  
Self Assembly ◽  
Microphase Separation ◽  
Small Angle Scattering ◽  
Angle Scattering ◽  
Copolymer Melts ◽  
Shear Processing ◽  
Kinetics Of

This article explores the dynamics, thermodynamics, and small-angle scattering of block copolymers. The goal is to determine what drives the applications of block copolymers, i.e. how block copolymers behave and how they are characterized. The article begins with a summary of the experimental data and various theories that comprise our understanding of block copolymer thermodynamics, with particular emphasis on phase behavior and especially the theory of microphase separation. It then considers topics related to block copolymer dynamics, including diffusion, viscoelasticity and rheology, shear-processing, and the kinetics of self-assembly. It also discusses small-angle scattering techniques as applied to block copolymer characterization, including scattering from ordered block copolymer melts.

scholarly journals Self-assembly of block copolymers under non-isothermal annealing conditions as revealed by grazing-incidence small-angle X-ray scattering

2020 ◽  
Vol 27 (5) ◽  
pp. 1278-1288 ◽  
Author(s):  
Marta Fernández-Regúlez ◽  
Eduardo Solano ◽  
Laura Evangelio ◽  
Steven Gottlieb ◽  
Christian Pinto-Gómez ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Small Angle ◽  
Self Assembly ◽  
Isothermal Annealing ◽  
Grazing Incidence ◽  
The Self ◽  
X Ray ◽  
Annealing Conditions ◽  
X Ray Scattering ◽  
Kinetics Of

An accurate knowledge of the parameters governing the kinetics of block copolymer self-assembly is crucial to model the time- and temperature-dependent evolution of pattern formation during annealing as well as to predict the most efficient conditions for the formation of defect-free patterns. Here, the self-assembly kinetics of a lamellar PS-b-PMMA block copolymer under both isothermal and non-isothermal annealing conditions are investigated by combining grazing-incidence small-angle X-ray scattering (GISAXS) experiments with a novel modelling methodology that accounts for the annealing history of the block copolymer film before it reaches the isothermal regime. Such a model allows conventional studies in isothermal annealing conditions to be extended to the more realistic case of non-isothermal annealing and prediction of the accuracy in the determination of the relevant parameters, namely the correlation length and the growth exponent, which define the kinetics of the self-assembly.

Chemically directed self-assembly of perpendicularly aligned cylinders by a liquid crystalline block copolymer

2015 ◽  
Vol 3 (12) ◽  
pp. 2837-2847 ◽  
Author(s):  
N. Yamashita ◽  
S. Watanabe ◽  
K. Nagai ◽  
M. Komura ◽  
T. Iyoda ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Self Assembly ◽  
Liquid Crystalline ◽  
Microphase Separation ◽  
Thermally Induced ◽  
Multiplication Process

Chemical epitaxy with a density multiplication process was applied to the perpendicularly oriented hexagonal cylinder nanostructure of liquid crystalline block copolymer (PEO-b-PMA(Az)) thin film through thermally induced microphase separation by using a newly designed PMA(Az)24 brush.

Directed self-assembly of high-chi block copolymer for nano fabrication of bit patterned media via solvent annealing

2016 ◽  
Vol 27 (41) ◽  
pp. 415601 ◽  
Author(s):  
Shisheng Xiong ◽  
Yves-Andre Chapuis ◽  
Lei Wan ◽  
He Gao ◽  
Xiao Li ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Bit Patterned Media ◽  
Solvent Annealing ◽  
Patterned Media ◽  
Nano Fabrication
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