Spectroscopic Diagnostics of Pulsed Microwave Plasmas used for Nanocrystalline Diamond Growth

2008 ◽  
Vol 14 (7-8) ◽  
pp. 173-180 ◽  
Author(s):  
Fabien Bénédic ◽  
Xavier Duten ◽  
Ousmane Syll ◽  
Guillaume Lombardi ◽  
Khaled Hassouni ◽  
...  
Keyword(s):  
Nanocrystalline Diamond ◽  
Diamond Growth ◽  
Microwave Plasmas ◽  
Spectroscopic Diagnostics

Nucleation Enhancement of Nanocrystalline Diamond Growth at Low Substrate Temperatures by Adamantane Seeding

2010 ◽  
Vol 114 (9) ◽  
pp. 3822-3824 ◽  
Author(s):  
K. Tsugawa ◽  
M. Ishihara ◽  
J. Kim ◽  
Y. Koga ◽  
M. Hasegawa
Keyword(s):  
Nanocrystalline Diamond ◽  
Diamond Growth ◽  
Substrate Temperatures

Nanocrystalline diamond growth in a surface-wave plasma

2011 ◽  
Vol 20 (5-6) ◽  
pp. 833-838 ◽  
Author(s):  
K. Tsugawa ◽  
S. Kawaki ◽  
M. Ishihara ◽  
J. Kim ◽  
Y. Koga ◽  
...  
Keyword(s):  
Surface Wave ◽  
Nanocrystalline Diamond ◽  
Diamond Growth

scholarly journals Isotope effects between hydrogen and deuterium microwave plasmas on chemical vapor deposition homoepitaxial diamond growth

2007 ◽  
Vol 101 (10) ◽  
pp. 103501 ◽  
Author(s):  
N. Mizuochi ◽  
J. Isoya ◽  
J. Niitsuma ◽  
T. Sekiguchi ◽  
H. Watanabe ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Isotope Effects ◽  
Chemical Vapor ◽  
Diamond Growth ◽  
Microwave Plasmas

Spectroscopic Determination of C2 Densities in AR/H 2/CH 4 and AR/H2/C60 Microwave Plasmas For Nanocrystalline Diamond Synthesis

1997 ◽  
Vol 502 ◽  
Author(s):  
A. N. Goyette ◽  
J. E. Lawler ◽  
L. W. Anderson ◽  
D. M. Gruen ◽  
T. G. Mccauley ◽  
...  
Keyword(s):  
Gas Phase ◽  
Diamond Films ◽  
High Sensitivity ◽  
Nanocrystalline Diamond ◽  
Chamber Pressure ◽  
Diamond Synthesis ◽  
Microwave Plasmas ◽  
State Concentration ◽  
Insight Into

ABSTRACTWe have measured the steady state concentration of gas phase C2 in Ar/H2/CH4 and Ar/H2/C60 microwave plasmas used for the deposition of nanocrystalline diamond films. High sensitivity white light absorption spectroscopy is used to monitor the C2 density using the d 3 Π ← a3Π (0,0) vibrational band of C2 as chamber pressure, microwave power, substrate temperature and feed gas mixtures are varied in both chemistries. Understanding how these parameters influence the C2 density in the plasma volume provides insight into discharge mechanisms relevant to the deposition of nanocrystalline diamond.

Spectroscopic diagnostics and modeling of Ar∕H2∕CH4 microwave discharges used for nanocrystalline diamond deposition

2004 ◽  
Vol 96 (11) ◽  
pp. 6739-6751 ◽  
Author(s):  
G. Lombardi ◽  
K. Hassouni ◽  
F. Bénédic ◽  
F. Mohasseb ◽  
J. Röpcke ◽  
...  
Keyword(s):  
Nanocrystalline Diamond ◽  
Diamond Deposition ◽  
Spectroscopic Diagnostics ◽  
Microwave Discharges

Synthesis and electron field emission of nanocrystalline diamond thin films grown from N2/CH4 microwave plasmas

1997 ◽  
Vol 82 (9) ◽  
pp. 4546-4550 ◽  
Author(s):  
D. Zhou ◽  
A. R. Krauss ◽  
L. C. Qin ◽  
T. G. McCauley ◽  
D. M. Gruen ◽  
...  
Keyword(s):  
Thin Films ◽  
Field Emission ◽  
Nanocrystalline Diamond ◽  
Electron Field Emission ◽  
Microwave Plasmas ◽  
Electron Field ◽  
Diamond Thin Films

scholarly journals The role of C2 in nanocrystalline diamond growth

2004 ◽  
Vol 96 (11) ◽  
pp. 6724-6732 ◽  
Author(s):  
J. R. Rabeau ◽  
P. John ◽  
J. I.B. Wilson ◽  
Y. Fan
Keyword(s):  
Nanocrystalline Diamond ◽  
Diamond Growth
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