Nucleation Enhancement of Nanocrystalline Diamond Growth at Low Substrate Temperatures by Adamantane Seeding

2010 ◽  
Vol 114 (9) ◽  
pp. 3822-3824 ◽  
Author(s):  
K. Tsugawa ◽  
M. Ishihara ◽  
J. Kim ◽  
Y. Koga ◽  
M. Hasegawa
Keyword(s):  
Nanocrystalline Diamond ◽  
Diamond Growth ◽  
Substrate Temperatures

Nanocrystalline diamond growth in a surface-wave plasma

2011 ◽  
Vol 20 (5-6) ◽  
pp. 833-838 ◽  
Author(s):  
K. Tsugawa ◽  
S. Kawaki ◽  
M. Ishihara ◽  
J. Kim ◽  
Y. Koga ◽  
...  
Keyword(s):  
Surface Wave ◽  
Nanocrystalline Diamond ◽  
Diamond Growth

Activation energy for diamond growth from the carbon–hydrogen gas system at low substrate temperatures

1997 ◽  
Vol 70 (2) ◽  
pp. 173-175 ◽  
Author(s):  
J. Stiegler ◽  
T. Lang ◽  
Y. von Kaenel ◽  
J. Michler ◽  
E. Blank
Keyword(s):  
Activation Energy ◽  
Hydrogen Gas ◽  
Diamond Growth ◽  
Gas System ◽  
Substrate Temperatures

scholarly journals The role of C2 in nanocrystalline diamond growth

2004 ◽  
Vol 96 (11) ◽  
pp. 6724-6732 ◽  
Author(s):  
J. R. Rabeau ◽  
P. John ◽  
J. I.B. Wilson ◽  
Y. Fan
Keyword(s):  
Nanocrystalline Diamond ◽  
Diamond Growth

An experimental study of the temperature and stoichiometry dependence of diamond growth in low pressure flat flames

1995 ◽  
Vol 10 (1) ◽  
pp. 149-157 ◽  
Author(s):  
J.S. Kim ◽  
M.A. Cappelli
Keyword(s):  
Film Growth ◽  
Diamond Films ◽  
Low Pressure ◽  
Diamond Growth ◽  
Process Conditions ◽  
Optimum Conditions ◽  
First Order ◽  
Flat Flame ◽  
Optimized Conditions ◽  
Substrate Temperatures

A study of the temperature and stoichiometry dependence of diamond synthesis in low pressure premixed acetylene-oxygen flames is presented. A specially designed low pressure flat flame operating at 40 Torr is employed to deposit diamond films uniformly over areas of at least 2 cm2. Under optimized conditions of substrate temperatures and flame equivalence ratios, high quality translucent diamond that is well faceted is synthesized exhibiting first-order Raman fullwidths (half maximum) of about 2.5 cm−1. Diamond growth rates under these optimum conditions are approximately 4 μm/h. The film growth rate is found to drop off substantially at high substrate temperatures, with little or no carbon deposited beyond a temperature of 1070 °C. The growth behavior in response to changes in flame equivalence ratio and substrate temperature is discussed in terms of the possible role that oxygen-containing species may have on surface chemistry. The results described here are also used to project a base cost for manufacturing diamond under these process conditions.

Nanocrystalline diamond growth on different substrates

2006 ◽  
Vol 515 (3) ◽  
pp. 1005-1010 ◽  
Author(s):  
W. Kulisch ◽  
C. Popov ◽  
V. Vorlicek ◽  
P.N. Gibson ◽  
G. Favaro
Keyword(s):  
Nanocrystalline Diamond ◽  
Diamond Growth

Effects of substrate temperature on nanocrystalline diamond growth: an in-situ optical study using pyrometric interferometry

2005 ◽  
Vol 482 (1-2) ◽  
pp. 50-55 ◽  
Author(s):  
P. Bruno ◽  
F. Bénédic ◽  
F. Mohasseb ◽  
F. Silva ◽  
K. Hassouni
Keyword(s):  
Substrate Temperature ◽  
Nanocrystalline Diamond ◽  
Diamond Growth ◽  
Optical Study
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