Wavelength dependence in photochemical vapor deposition of aluminum film using dimethylaluminum hydride

1991 ◽  
Vol 5 (4) ◽  
pp. 289-293 ◽  
Author(s):  
Mitsuga Hanabusa ◽  
Masashi Ikeda
Keyword(s):  
Vapor Deposition ◽  
Wavelength Dependence ◽  
Aluminum Film ◽  
Photochemical Vapor Deposition ◽  
Dimethylaluminum Hydride

Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride

1988 ◽  
Vol 27 (Part 2, No. 8) ◽  
pp. L1392-L1394 ◽  
Author(s):  
Mitsugu Hanabusa ◽  
Kikuo Hayakawa ◽  
Akira Oikawa ◽  
Katsunori Maeda
Keyword(s):  
Thin Films ◽  
Vapor Deposition ◽  
Photochemical Vapor Deposition ◽  
Dimethylaluminum Hydride

Scanning Tunneling Microscopic Study of the Growth Process in Photochemical Vapor Deposition of Aluminum Film

1990 ◽  
Vol 201 ◽  
Author(s):  
Mitsugu Hanabusa ◽  
Kouji Sahara
Keyword(s):  
Vacuum Ultraviolet ◽  
Early Stage ◽  
Aluminum Hydride ◽  
Wavelength Dependence ◽  
Aluminum Film ◽  
Scanning Tunneling ◽  
Horizontal Growth ◽  
Ultraviolet Photons ◽  
Photochemical Vapor Deposition ◽  
Deuterium Lamp

AbstractAluminum thin films were photodeposited on silicon wafer from dimethyl-aluminum hydride under illumination of the ultraviolet photons generated by a deuterium lamp with a distinguished wavelength dependence. Namely, the growth rates increase linearly with vapor pressure under illumination of the l60-nm vacuum ultraviolet band from the lamp, while the growth starts above 0.3 mTorr only with the 240-nm band. To study the early stage of photo-deposition of Al, we constructed a scanning tunneling microscope and observed Al, islands. Steep sides were observed on islands with the distinguished boundary between vertical and horizontal growth. The shape of islands formed in the illuminated region and in the dark area was identical, thus indicating the absence of photo-induced migration effects.

Preparation and properties of microcrystalline silicon films using photochemical vapor deposition

1983 ◽  
Vol 59-60 ◽  
pp. 715-718 ◽  
Author(s):  
Tadashi Saitoh ◽  
Toshikazu Shimada ◽  
Masataka Migitaka ◽  
Yasuo Tarui
Keyword(s):  
Vapor Deposition ◽  
Silicon Films ◽  
Microcrystalline Silicon ◽  
Photochemical Vapor Deposition

Photochemical vapor deposition of titaniumdiboride

1990 ◽  
Vol 46 (1-4) ◽  
pp. 215-219 ◽  
Author(s):  
J. Elders ◽  
D. Bebelaar ◽  
J.D.W. van Voorst
Keyword(s):  
Vapor Deposition ◽  
Photochemical Vapor Deposition

Epitaxial growth of Ge films on GaAs (285–415 °C) by laser photochemical vapor deposition

1988 ◽  
Vol 52 (20) ◽  
pp. 1710-1712 ◽  
Author(s):  
V. Tavitian ◽  
C. J. Kiely ◽  
D. B. Geohegan ◽  
J. G. Eden
Keyword(s):  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Photochemical Vapor Deposition
Sign in / Sign up

Export Citation Format

Share Document