Large‐Area Fabrication of Highly Tunable Hybrid Plasmonic–Photonic Structures Based on Colloidal Lithography and a Photoreconfigurable Polymer

2019 ◽  
Vol 7 (19) ◽  
pp. 1900483 ◽  
Author(s):  
Shiqiang Wang ◽  
Hao Dong ◽  
Fuwei Sun ◽  
Wanlin Zhang ◽  
Yun Liang ◽  
...  
Keyword(s):  
Colloidal Lithography ◽  
Large Area ◽  
Photonic Structures

Synthesis of monodisperse single-crystal Cu2O spheres and their application in generating structural colors

2019 ◽  
Vol 7 (15) ◽  
pp. 4551-4558 ◽  
Author(s):  
Jiajie Bi ◽  
Suli Wu ◽  
Hongbo Xia ◽  
Lu Li ◽  
Shufen Zhang
Keyword(s):  
Single Crystal ◽  
Room Temperature ◽  
Building Blocks ◽  
Large Area ◽  
Structural Colors ◽  
Photonic Structures ◽  
Spray Method ◽  
Solid Spheres

A two-step reductive strategy is developed to synthesize monodisperse single-crystal Cu2O solid spheres at room-temperature. The single-crystal spheres with adjustable diameter were used as building blocks to form amorphous photonic structures by spray method, which exhibits vivid colors. This may open a new way to realize large area film with vivid structure color.

Fabrication of large area homogeneous metallic nanostructures for optical sensing using colloidal lithography

2010 ◽  
Vol 87 (5-8) ◽  
pp. 1471-1474 ◽  
Author(s):  
R.L. Eriksen ◽  
A. Pors ◽  
J. Dreier ◽  
A.C. Simonsen ◽  
O. Albrektsen
Keyword(s):  
Optical Sensing ◽  
Metallic Nanostructures ◽  
Colloidal Lithography ◽  
Large Area

scholarly journals Growth of III-nitride photonic structures on large area silicon substrates

2006 ◽  
Vol 88 (17) ◽  
pp. 171909 ◽  
Author(s):  
J. Li ◽  
J. Y. Lin ◽  
H. X. Jiang
Keyword(s):  
Silicon Substrates ◽  
Large Area ◽  
Photonic Structures

scholarly journals Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

2012 ◽  
Vol 3 ◽  
pp. 884-892 ◽  
Author(s):  
Adrian Iovan ◽  
Marco Fischer ◽  
Roberto Lo Conte ◽  
Vladislav Korenivski
Keyword(s):  
Electronic Devices ◽  
Point Contact ◽  
Metallic Materials ◽  
Colloidal Lithography ◽  
Large Area ◽  
Fully Integrated ◽  
Broad Application ◽  
Circuit Integration

Patterning of materials at sub-10 nm dimensions is at the forefront of nanotechnology and employs techniques of various complexity, efficiency, areal scale, and cost. Colloid-based patterning is known to be capable of producing individual sub-10 nm objects. However, ordered, large-area nano-arrays, fully integrated into photonic or electronic devices have remained a challenging task. In this work, we extend the practice of colloidal lithography to producing large-area sub-10 nm point-contact arrays and demonstrate their circuit integration into spin-photo-electronic devices. The reported nanofabrication method should have broad application areas in nanotechnology as it allows ballistic-injection devices, even for metallic materials with relatively short characteristic relaxation lengths.

Microscale screen printing of large-area arrays of microparticles for the fabrication of photonic structures and for optical sorting

2018 ◽  
Vol 6 (44) ◽  
pp. 12031-12037 ◽  
Author(s):  
Mark A. Rose ◽  
T. P. Vinod ◽  
Stephen A. Morin
Keyword(s):  
Screen Printing ◽  
Large Area ◽  
Photonic Structures ◽  
Optical Sorting ◽  
New Strategy ◽  
Potential Applications

This report describes a new strategy, microparticle screen printing (μSP), generally applicable to the fabrication of homo/heterogeneous arrays of functional particles with potential applications in photonics, optoelectronics, and optical sorting/barcoding.

Large-area photonic structures in freestanding films

2007 ◽  
Vol 91 (10) ◽  
pp. 103114 ◽  
Author(s):  
Francesco Vita ◽  
Daniele E. Lucchetta ◽  
Riccardo Castagna ◽  
Luigino Criante ◽  
Francesco Simoni
Keyword(s):  
Large Area ◽  
Photonic Structures

Two-dimensional hexagonal symmetry diffraction pattern by SiO2 photonic structures fabricated by hot embossing

2017 ◽  
Vol 10 (03) ◽  
pp. 1750031
Author(s):  
Liangwei Wang ◽  
Shuai Guo ◽  
Ke Chai ◽  
Liang Liang ◽  
An li ◽  
...  
Keyword(s):  
Diffraction Pattern ◽  
Diffraction Efficiency ◽  
Incident Angle ◽  
Sol Gel ◽  
Hot Embossing ◽  
Single Step ◽  
Two Dimensional ◽  
Hexagonal Symmetry ◽  
Large Area ◽  
Photonic Structures

Using synthesized sol–gel nanoimprint resist, large-area, ordered SiO2 cylindrical and stripe photonic nanostructures with constant aspect ratio have been fabricated by a single-step soft stamp hot embossing nanoimprint. Different from the traditional hot embossing nanoimprint technique, in our imprint process, the external force applied to the soft stamp is provided just by using our hand. Since the stress can be well released, the stamp can be easily released after the hot stage cooling down. So the optical window (K9 glass) substrates with imprinted two-dimensional SiO2 cylindrical photonic nanostructures show good light diffraction property. Also, our experiment demonstrates that with the imprinted sample annealing at 200[Formula: see text]C, the density of SiO2 will be increased and the diffraction efficiency can be further enhanced. In addition, the light splitting characteristic can still keep good for a larger (6 inch) substrate, which has a certain radian. This illustrates that this nanoimprint method can be compatible with the fluctuation of the imprinted substrates. Furthermore, as the distance between two adjacent feature nanostructures is in sub-micro scale, hexagonal symmetry diffraction pattern by the cylindrical photonic structures was realized at normal incidence of monochromatic laser ([Formula: see text]532[Formula: see text]nm). The diffraction efficiency of first order is about 11.2%. Morever, the diffraction pattern and the intensity of the first diffraction order can be modulated just by changing the incident angle of the input laser.

scholarly journals Large-area, polarisation-sensitive plasmonic materials from colloidal lithography

2016 ◽  
Vol 10 (5) ◽  
pp. 404-408 ◽  
Author(s):  
Anthony John Morfa ◽  
Valerio Oddone ◽  
Michael Giersig
Keyword(s):  
Colloidal Lithography ◽  
Large Area ◽  
Plasmonic Materials

Repetitive Hole-Mask Colloidal Lithography for the Fabrication of Large-Area Low-Cost Plasmonic Multishape Single-Layer Metasurfaces

2015 ◽  
Vol 3 (5) ◽  
pp. 680-686 ◽  
Author(s):  
Jun Zhao ◽  
Sarah Jaber ◽  
Paul Mulvaney ◽  
Paul V. Braun ◽  
Harald Giessen
Keyword(s):  
Low Cost ◽  
Single Layer ◽  
Colloidal Lithography ◽  
Large Area

scholarly journals Rayleigh anomaly-enabled mode hybridization in gold nanohole arrays by scalable colloidal lithography for highly-sensitive biosensing

Nanophotonics ◽  
2022 ◽  
Vol 0 (0) ◽  
Author(s):  
Zhiliang Zhang ◽  
Feng Zhao ◽  
Renxian Gao ◽  
Chih-Yu Jao ◽  
Churong Ma ◽  
...  
Keyword(s):  
Refractive Index ◽  
Plasmonic Nanostructures ◽  
Label Free ◽  
Colloidal Lithography ◽  
Large Area ◽  
Nanohole Array ◽  
Highly Sensitive ◽  
Label Free Detection ◽  
Nanohole Arrays ◽  
Rayleigh Anomaly

Abstract Plasmonic sensors exhibit tremendous potential to accomplish real-time, label-free, and high-sensitivity biosensing. Gold nanohole array (GNA) is one of the classic plasmonic nanostructures that can be readily fabricated and integrated into microfluidic platforms for a variety of applications. Even though GNA has been widely studied, new phenomena and applications are still emerging continuously expanding its capabilities. In this article, we demonstrated narrow-band high-order resonances enabled by Rayleigh anomaly in the nanohole arrays that are fabricated by scalable colloidal lithography. We fabricated large-area GNAs with different hole diameters, and investigated their transmission characteristics both numerically and experimentally. We showed that mode hybridization between the plasmon mode of the nanoholes and Rayleigh anomaly of the array could give rise to high-quality decapole resonance with a unique nearfield profile. We experimentally achieved a refractive index sensitivity, i.e., RIS up to 407 nm/RIU. More importantly, we introduced a spectrometer-free refractive index sensing based on lens-free smartphone imaging of GNAs with (intensity) sensitivity up to 137%/RIU. Using this platform, we realized the label-free detection of BSA molecules with concentration as low as 10−8 M. We believe our work could pave the way for highly sensitive and compact point-of-care devices with cost-effective and high-throughput plasmonic chips.

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