Patterning: High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates (Adv. Mater. 42/2012)

2012 ◽  
Vol 24 (42) ◽  
pp. 5687-5687 ◽  
Author(s):  
Xiaodan Gu ◽  
Zuwei Liu ◽  
Ilja Gunkel ◽  
S. T. Chourou ◽  
Sung Woo Hong ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Silicon Trenches

High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates

2012 ◽  
Vol 24 (42) ◽  
pp. 5688-5694 ◽  
Author(s):  
Xiaodan Gu ◽  
Zuwei Liu ◽  
Ilja Gunkel ◽  
S. T. Chourou ◽  
Sung Woo Hong ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Silicon Trenches

Polypyrrole Nanowire Array with High Aspect Ratio Fabricated by Block-Copolymer-Templated Electropolymerization

2011 ◽  
Vol 1312 ◽  
Author(s):  
Hideaki Komiyama ◽  
Tomokazu Iyoda ◽  
Kaori Kamata
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Aspect Ratio ◽  
Polymer Film ◽  
High Aspect Ratio ◽  
Mixed Solvent ◽  
Nanowire Array ◽  
Selective Removal ◽  
Ito Electrode ◽  
Conducting Polypyrrole

ABSTRACTConducting polypyrrole (PPy) nanowire array was electrochemically fabricated by using microphase-separated block copolymer (PEOm-b-PMA(Az)n) thin film as an electrode template. Electropolymerization proceeds selectively through the perpendiculary oriented PEO nanocylindrical microdomains on an ITO electrode coated by the above polymer film. The length of the PPy nanowires was controllable in range of 10-120 nm by the thickness of the coated template film and the amount of passed charge. A 10 nm of diameter, 27 nm of periodicity, and 12 of aspect ratio of the crystalline PPy nanowires were successfully achieved. Selective removal of the template is also achieved simply by rinsing with solubility-controlled mixed solvent.

Densely Packed Arrays of Ultra-High-Aspect-Ratio Silicon Nanowires Fabricated using Block-Copolymer Lithography and Metal-Assisted Etching

2009 ◽  
Vol 19 (15) ◽  
pp. 2495-2500 ◽  
Author(s):  
Shih-Wei Chang ◽  
Vivian P. Chuang ◽  
Steven T. Boles ◽  
Caroline A. Ross ◽  
Carl V. Thompson
Keyword(s):  
Block Copolymer ◽  
Aspect Ratio ◽  
Silicon Nanowires ◽  
High Aspect Ratio ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Etching High Aspect Ratio Silicon Trenches

2003 ◽  
Vol 150 (10) ◽  
pp. G612 ◽  
Author(s):  
Siddhartha Panda ◽  
Rajiv Ranade ◽  
G. Swami Mathad
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Silicon Trenches

Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process

2019 ◽  
Vol 33 (8) ◽  
pp. 3755-3760
Author(s):  
Sung-Won Youn ◽  
Kenta Suzuki ◽  
Hideki Takagi ◽  
Hiroshi Hiroshima ◽  
Yoshinori Kinoshita ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Aspect Ratio ◽  
High Aspect Ratio

scholarly journals Functional Carbon Nanoflakes with High Aspect Ratio by Pyrolysis of Cured Templates of Block Copolymer and Phenolic Resin

2007 ◽  
Vol 19 (13) ◽  
pp. 3093-3095 ◽  
Author(s):  
Antti Soininen ◽  
Sami Valkama ◽  
Antti Nykänen ◽  
Ari Laiho ◽  
Harri Kosonen ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Phenolic Resin ◽  
Carbon Nanoflakes

Metal-Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio

2013 ◽  
Vol 26 (5) ◽  
pp. 791-795 ◽  
Author(s):  
So Youn Kim ◽  
Jessica Gwyther ◽  
Ian Manners ◽  
Paul M. Chaikin ◽  
Richard A. Register
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Wire Grid
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