Mechanical Properties of Diamond-Structured Polymer Microlattices Coated with the Silicon Nitride Film

2015 ◽  
Vol 18 (2) ◽  
pp. 236-240 ◽  
Author(s):  
Yong Feng Zhou ◽  
Chang Zhuang Yao ◽  
Qing Lin Yang ◽  
Lin Guo ◽  
Lei Jiang
Keyword(s):  
Mechanical Properties ◽  
Silicon Nitride ◽  
Nitride Film ◽  
Silicon Nitride Film

Influence of Gas Flow Ratio in PE-CVD Process on Mechanical Properties of Silicon Nitride Film

2008 ◽  
Vol 3 (3) ◽  
pp. 281-289 ◽  
Author(s):  
Hyun-Jin Oh ◽  
Yoshitada Isono ◽  
Takahiro Namazu ◽  
Yoshihiro Saito ◽  
Akira Yamaguchi
Keyword(s):  
Mechanical Properties ◽  
Silicon Nitride ◽  
Gas Flow ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Flow Ratio ◽  
Gas Flow Ratio

Microbridge Testing of Thin Films Under Small Deformation

1999 ◽  
Vol 594 ◽  
Author(s):  
T. Y. Zhang ◽  
Y. J. Su ◽  
C. F. Qian ◽  
M. H. Zhao ◽  
L. Q. Chen
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Silicon Nitride ◽  
Young’S Modulus ◽  
Young's Modulus ◽  
Chemical Vapor ◽  
Small Deformation ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Pressure Chemical

AbstractThe present work proposes a novel microbridge testing method to simultaneously evaluate the Young's modulus, residual stress of thin films under small deformation. Theoretic analysis and finite element calculation are conducted on microbridge deformation to provide a closed formula of deflection versus load, considering both substrate deformation and residual stress in the film. Silicon nitride films fabricated by low pressure chemical vapor deposition on silicon substrates are tested to demonstrate the proposed method. The results show that the Young's modulus and residual stress for the annealed silicon nitride film are respectively 202 GPa and 334.9 MPa.

Investigation on the composition and structure of silicon nitride film prepared by ECR-PECVD

1994 ◽  
Vol 3 (9) ◽  
pp. 682-689 ◽  
Author(s):  
Chen Jun-fang ◽  
Cheng Shao-yu ◽  
Ren Zhao-xing ◽  
Zhang Su-qing ◽  
Ning Zhao-yuan ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Composition And Structure

The Selective Epitaxial Growth of Silicon by Using Silicon Nitride Film as a Mask

1971 ◽  
Vol 10 (12) ◽  
pp. 1675-1679 ◽  
Author(s):  
Hiroshi Ogawa ◽  
Tatau Nishinaga ◽  
Masanobu Kasuga ◽  
Tetsuya Arizumi
Keyword(s):  
Silicon Nitride ◽  
Epitaxial Growth ◽  
Nitride Film ◽  
Silicon Nitride Film ◽  
Selective Epitaxial Growth
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