Photomask Technology 2018
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45
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3
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Published By SPIE

9781510622159, 9781510622166
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production

2019 ◽  
Author(s):  
Renzo Capelli ◽  
Nathan Wilcox ◽  
Dirk Hellweg ◽  
Martin Dietzel ◽  
Scott Chegwidden ◽  
...  
Keyword(s):  
Crucial Step

Mask process correction validation for multi-beam mask lithography

2018 ◽  
Author(s):  
Ingo Bork ◽  
Peter Buck ◽  
Bhardwaj Durvasula ◽  
Stefan Eder-Kapl ◽  
Peter Hudek ◽  
...  

AIMS™ EUV tool platform: aerial-image based qualification of EUV masks (Conference Presentation)

2018 ◽  
Author(s):  
Renzo Capelli ◽  
Dirk Hellweg ◽  
Martin Dietzel ◽  
Ralf Gehrke ◽  
Markus Bauer ◽  
...  
Keyword(s):  
Aerial Image

Lithographic benefits and mask manufacturability study of curvilinear masks

2018 ◽  
Author(s):  
Alexander Wei ◽  
Wei Guo ◽  
Fan Jiang ◽  
Jed Rankin ◽  
Alexander Tritchkov ◽  
...  

E-beam based EUV mask characterization for studying mask induced wafer effects

2018 ◽  
Author(s):  
Vidya Vaenkatesan ◽  
Qing Tian ◽  
Emily Gallagher ◽  
Jim Wiley ◽  
Jo Finders ◽  
...  
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