Lithographic benefits and mask manufacturability study of curvilinear masks

Photomask Technology 2018 ◽

10.1117/12.2501973 ◽

2018 ◽

Author(s):

Alexander Wei ◽

Wei Guo ◽

Fan Jiang ◽

Jed Rankin ◽

Alexander Tritchkov ◽

...

Download Full-text