Design-Process-Technology Co-optimization XV
Latest Publications

TOTAL DOCUMENTS

36
(FIVE YEARS 36)

H-INDEX

0
(FIVE YEARS 0)

Published By SPIE

9781510640610, 9781510640627
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Using machine learning etch models in OPC and ILT correction

2021 ◽  
Author(s):  
Kevin Hooker ◽  
Lena Zavyalova ◽  
Shuo Huang ◽  
Li-Jin Chen
Keyword(s):  
Machine Learning

Machine learning based recursive partitioning for simplifying OPC model building complexity

2021 ◽  
Author(s):  
Apoorva Oak ◽  
Soobin Hwang ◽  
Ruoxia Chen ◽  
Shinill Kang ◽  
Ryan Ryoung-Han Kim
Keyword(s):  
Machine Learning ◽  
Model Building ◽  
Recursive Partitioning

Machine-learning assisted fast critical area analysis

2021 ◽  
Author(s):  
Uwe Paul Schroeder ◽  
Janam Bakshi ◽  
David Villarreal
Keyword(s):  
Machine Learning ◽  
Critical Area

Design-technology co-optimization of sequential and monolithic CFET as enabler of technology node beyond 2nm

2021 ◽  
Author(s):  
Bilal Chehab ◽  
Julien Ryckaert ◽  
Pieter Schuddinck ◽  
Pieter Weckx ◽  
Naoto Horiguchi ◽  
...  
Keyword(s):  
Design Technology ◽  
Technology Node
Load More ...
Sign in / Sign up

Export Citation Format

Share Document