[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium
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Uniformity measures in semiconductor manufacturing

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263708 ◽

2002 ◽

Author(s):

A.M. Hurwitz

Keyword(s):

Semiconductor Manufacturing

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Particle concentrations over production tools during processing; a comparison of facilities worldwide

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263699 ◽

2002 ◽

Author(s):

S. Abuzeid

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How to implement a customer satisfaction survey to drive your MIS organization

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263690 ◽

2002 ◽

Author(s):

S.D. Aulds

Keyword(s):

Customer Satisfaction ◽

Satisfaction Survey ◽

Customer Satisfaction Survey

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A prospectus for gigascale integration (GSI)

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263706 ◽

2002 ◽

Author(s):

J.D. Meindl

Keyword(s):

Gigascale Integration

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Product evolution vs. product revolution maximizing continuous improvement while minimizing risk

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263691 ◽

2002 ◽

Author(s):

E.A. Englhardt

Keyword(s):

Continuous Improvement ◽

Product Evolution

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Building effective alliances

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263695 ◽

2002 ◽

Author(s):

C.F. Painter

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Key factors in designing a manufacturing line to maximize tool utilization and minimize turnaround time

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263701 ◽

2002 ◽

Cited By ~ 6

Author(s):

D.P. Martin

Keyword(s):

Turnaround Time ◽

Key Factors ◽

Manufacturing Line

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In situ particle monitoring in a single wafer poly silicon and silicon nitride etch system

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263705 ◽

2002 ◽

Cited By ~ 2

Author(s):

B. Busselman ◽

T. Emery ◽

K. Staker ◽

K. Heiman ◽

D. Tran ◽

...

Keyword(s):

Silicon Nitride ◽

Poly Silicon ◽

Particle Monitoring

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The development and implementation of a cell controller framework

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263700 ◽

2002 ◽

Cited By ~ 5

Author(s):

K. Nguyen

Keyword(s):

A Cell ◽

Cell Controller

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Diagnostic monitoring of photoresist ashing

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium ◽

10.1109/ismss.1993.263704 ◽

2002 ◽

Cited By ~ 3

Author(s):

J.A. Stefani ◽

L.M. Loewenstein ◽

M. Sullivan

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[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science SymposiumLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Uniformity measures in semiconductor manufacturing

Particle concentrations over production tools during processing; a comparison of facilities worldwide

How to implement a customer satisfaction survey to drive your MIS organization

A prospectus for gigascale integration (GSI)

Product evolution vs. product revolution maximizing continuous improvement while minimizing risk

Building effective alliances

Key factors in designing a manufacturing line to maximize tool utilization and minimize turnaround time

In situ particle monitoring in a single wafer poly silicon and silicon nitride etch system

The development and implementation of a cell controller framework

Diagnostic monitoring of photoresist ashing

[1993 Proceedings] IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Latest Publications