Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
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Published By SPIE

9781510622012, 9781510622029

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Front Matter: Volume 10807

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2504156 ◽

2018 ◽

Keyword(s):

Matter Volume

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eBeam initiative surveys report greatly increased confidence in EUV and mask process correction requirements

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2323961 ◽

2018 ◽

Author(s):

Jan Willis ◽

Aki Fujimura

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Achieve high hotspot detection accuracy by pattern scoring

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2323956 ◽

2018 ◽

Author(s):

Xiang Fang ◽

Shou-Yuan Ma ◽

Chien-Nan Lin ◽

Hsu-Tang Liu ◽

Chuan-Chun Lee ◽

...

Keyword(s):

Detection Accuracy ◽

Hotspot Detection

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Enabling accurate and cost-effective registration metrology on EUVL masks

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2325128 ◽

2018 ◽

Author(s):

Runyuan Han ◽

Hendrik Steigerwald ◽

Frank Laske ◽

Klaus-Dieter Roeth

Keyword(s):

Cost Effective

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Novel thermoplastic SOC materials for planarization use in multilayer lithography process

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2324693 ◽

2018 ◽

Author(s):

Keisuke Kawashima ◽

Koji Inoue ◽

Takashi Oda ◽

Kazuo Kohmura

Keyword(s):

Lithography Process

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Exposure characteristics of ternary copolymerization positive tone electron beam resist containing p-chloro-α-methylstyrene

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2324709 ◽

2018 ◽

Author(s):

Kenta Tamaru ◽

Shunsuke Ochiai ◽

Yukiko Kishimura ◽

Hironori Asada ◽

Ryoichi Hoshino ◽

...

Keyword(s):

Electron Beam

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Shin-Etsu super-high-flat substrate for FPD panel photomask

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2324277 ◽

2018 ◽

Author(s):

Atsushi Watabe ◽

Daijitsu Harada ◽

Masaki Takeuchi ◽

Youkou Ishitsuka

Keyword(s):

Flat Substrate

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Development of closed-type EUV pellicle

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2324819 ◽

2018 ◽

Author(s):

Yosuke Ono ◽

Kazuo Kohmura ◽

Atsushi Okubo ◽

Daiki Taneichi ◽

Hisako Ishikawa ◽

...

Keyword(s):

Closed Type

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EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2501999 ◽

2018 ◽

Cited By ~ 1

Author(s):

Genta Watanabe ◽

Norihito Fukugami ◽

Toru Komizo ◽

Yutaka Kodera ◽

Toshio Konishi

Keyword(s):

Light Reflection

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Progress in nanoimprint wafer and mask systems for high volume semiconductor manufacturing

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology ◽

10.1117/12.2326865 ◽

2018 ◽

Author(s):

NAOKI MURASATO ◽

Tsuyoshi Arai

Keyword(s):

Semiconductor Manufacturing ◽

High Volume

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Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask TechnologyLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By SPIE

Front Matter: Volume 10807

eBeam initiative surveys report greatly increased confidence in EUV and mask process correction requirements

Achieve high hotspot detection accuracy by pattern scoring

Enabling accurate and cost-effective registration metrology on EUVL masks

Novel thermoplastic SOC materials for planarization use in multilayer lithography process

Exposure characteristics of ternary copolymerization positive tone electron beam resist containing p-chloro-α-methylstyrene

Shin-Etsu super-high-flat substrate for FPD panel photomask

Development of closed-type EUV pellicle

EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection

Progress in nanoimprint wafer and mask systems for high volume semiconductor manufacturing

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
Latest Publications