Field Guide to Optical Lithography
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80

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2

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Published By SPIE

9780819462077

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Optical Proximity Effects

Field Guide to Optical Lithography ◽

10.1117/3.665802.p81 ◽

2009 ◽

pp. 81-81

Keyword(s):

Proximity Effects

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Phase-Shift Masks

Field Guide to Optical Lithography ◽

10.1117/3.665802.p78 ◽

2009 ◽

pp. 78-78 ◽

Cited By ~ 1

Keyword(s):

Phase Shift

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Rayleigh Criteria: Resolution

Field Guide to Optical Lithography ◽

10.1117/3.665802.p74 ◽

2009 ◽

pp. 74-74

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Metrology: Critical Dimension

Field Guide to Optical Lithography ◽

10.1117/3.665802.p67 ◽

2009 ◽

pp. 67-67

Keyword(s):

Critical Dimension

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Defining Photoresist Linewidth

Field Guide to Optical Lithography ◽

10.1117/3.665802.p61 ◽

2009 ◽

pp. 61-61

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Developer Temperature and Concentration

Field Guide to Optical Lithography ◽

10.1117/3.665802.p51 ◽

2009 ◽

pp. 51-51

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Standing Waves: Mathematics

Field Guide to Optical Lithography ◽

10.1117/3.665802.p34 ◽

2009 ◽

pp. 34-34

Keyword(s):

Standing Waves

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Standing Waves: Definition

Field Guide to Optical Lithography ◽

10.1117/3.665802.p33 ◽

2009 ◽

pp. 33-33

Keyword(s):

Standing Waves

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Immersion Lithography: Resolution

Field Guide to Optical Lithography ◽

10.1117/3.665802.p31 ◽

2009 ◽

pp. 31-31

Keyword(s):

Immersion Lithography

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Flare

Field Guide to Optical Lithography ◽

10.1117/3.665802.p26 ◽

2009 ◽

pp. 26-26

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