2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference
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62
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9781612844084
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Inline control of an ultra low-k ILD layer using Broadband Spectroscopic Ellipsometry

2011 ◽  
Author(s):  
Ronny Haupt ◽  
Jiang Zhiming ◽  
Leander Haensel ◽  
Ulf Peter Mueller ◽  
Ulrich Mayer
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Low K

Lithography cost savings through resist reduction and monitoring program

2011 ◽  
Author(s):  
Terri Couteau ◽  
Scott Lindauer ◽  
Chris Stewart ◽  
Jennifer Braggin ◽  
Brent Bjornberg
Keyword(s):  
Monitoring Program ◽  
Cost Savings

On the technology and ecosystem of 3D / TSV manufacturing

2011 ◽  
Author(s):  
Klaus Hummler ◽  
Larry Smith ◽  
Raymond Caramto ◽  
Robert Edgeworth ◽  
Stephen Olson ◽  
...  

A new device for highly accurate gas flow control with extremely fast response times

2011 ◽  
Author(s):  
Kevin Boyd ◽  
Adam Monkowski ◽  
Jialing Chen ◽  
Tao Ding ◽  
Ray Malone ◽  
...  
Keyword(s):  
Flow Control ◽  
Gas Flow ◽  
Response Times ◽  
Fast Response ◽  
New Device

Embedded memory fail analysis for production yield enhancement

2011 ◽  
Author(s):  
Youssef Baltagi ◽  
Daniele Li Rosi ◽  
Vincenzo Tancorre ◽  
Christophe Garagnon ◽  
Eric Faehn ◽  
...  
Keyword(s):  
Production Yield ◽  
Yield Enhancement ◽  
Embedded Memory

Low-k etching using CF3I, a path to overcome current BEOL integration issues

2011 ◽  
Author(s):  
Adam J. Gildea ◽  
Justin C. Long ◽  
Eric Eisenbraun ◽  
Vincent Omarjee ◽  
Nathan Stafford ◽  
...  
Keyword(s):  
Low K
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