11th International Workshop on Junction Technology (IWJT)
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9781612841311
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Dopant and carrier profiling for 3D-device architectures

2011 ◽  
Author(s):  
Jay Mody ◽  
A K Kambham ◽  
G. Zschatzsch ◽  
T. Chiarella ◽  
N. Collaert ◽  
...  

Evolution of dopants and defects in silicon under various annealing sequences

2011 ◽  
Author(s):  
A. J. Mayur ◽  
J. P. Li ◽  
B. Adams ◽  
S. Moffatt ◽  
B. Ng ◽  
...  

Integration of a plasma doping PULSION® process into a fully depleted SOI transistor flow chart

2011 ◽  
Author(s):  
Julian Duchaine ◽  
Frederic Gonzatti ◽  
Frank Torregrosa ◽  
Hasnaa Etienne ◽  
Susan Felch ◽  
...  
Keyword(s):  
Flow Chart ◽  
Fully Depleted ◽  
Plasma Doping
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