Line roughness improvements on self-aligned quadruple patterning by wafer stress engineering
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2009 ◽
Vol 27
(3)
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pp. 1261
2013 ◽
Vol 768-769
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pp. 613-619
2019 ◽
Vol 67
(42)
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pp. 11703-11709
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Keyword(s):
2006 ◽
pp. 1061-1066
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