shear force microscopy
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2018 ◽  
Vol 6 (1) ◽  
Author(s):  
Juhee Ko ◽  
Amun Jarzembski ◽  
Keunhan Park ◽  
Jungchul Lee

2018 ◽  
Vol 30 (39) ◽  
pp. 1803748 ◽  
Author(s):  
Xiaomin Xu ◽  
Thorsten Schultz ◽  
Ziyu Qin ◽  
Nikolai Severin ◽  
Benedikt Haas ◽  
...  

2018 ◽  
Vol 271 (2) ◽  
pp. 222-229 ◽  
Author(s):  
Z. BI ◽  
W. CAI ◽  
Y. WANG ◽  
G. SHANG

2017 ◽  
Vol 199 ◽  
pp. 299-309 ◽  
Author(s):  
Günther Krämer ◽  
Florian Hausen ◽  
Roland Bennewitz

The confinement of liquids in nanometer-scale gaps can lead to changes in their viscous shear properties. For liquids of polar molecules, the charge state of the confining surfaces has a significant influence on the structure in the confined liquid. Here we report on the implementation of dynamic shear force microscopy in an electrochemical cell. Lateral oscillations of the tip of an atomic force microscope were magnetically activated at a frequency of about 50 kHz. The damping of the lateral tip oscillation was recorded as a function of the tip–sample distance and of the electrode potential at the surface of a Au(100) single crystal electrode. The influence of surface charges on the shear response of the nano-confined liquids was demonstrated for the ionic liquid [EMIM][NTf2] and for aqueous Na2SO4 solution.


2016 ◽  
Vol 28 (13) ◽  
pp. 134004 ◽  
Author(s):  
Marc-Dominik Krass ◽  
Nitya Nand Gosvami ◽  
Robert W Carpick ◽  
Martin H Müser ◽  
Roland Bennewitz

2015 ◽  
Vol 41 ◽  
pp. 32-39 ◽  
Author(s):  
Francesco Tantussi ◽  
Daniele Vella ◽  
Maria Allegrini ◽  
Francesco Fuso ◽  
Luca Romoli ◽  
...  

2015 ◽  
Vol 2015 ◽  
pp. 1-7 ◽  
Author(s):  
Sadegh Mehdi Aghaei ◽  
Navid Yasrebi ◽  
Bizhan Rashidian

Line nanopatterns are produced on the positive photoresist by scanning near-field optical microscope (SNOM). A laser diode with a wavelength of 450 nm and a power of 250 mW as the light source and an aluminum coated nanoprobe with a 70 nm aperture at the tip apex have been employed. A neutral density filter has been used to control the exposure power of the photoresist. It is found that the changes induced by light in the photoresist can be detected byin situshear force microscopy (ShFM), before the development of the photoresist. Scanning electron microscope (SEM) images of the developed photoresist have been used to optimize the scanning speed and the power required for exposure, in order to minimize the final line width. It is shown that nanometric lines with a minimum width of 33 nm can be achieved with a scanning speed of 75 µm/s and a laser power of 113 mW. It is also revealed that the overexposure of the photoresist by continuous wave laser generated heat can be prevented by means of proper photoresist selection. In addition, the effects of multiple exposures of nanopatterns on their width and depth are investigated.


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