Structural and Morphological Properties of As-Deposited and Heat Treated Blended Graphene Oxide / Poly(3,4-Ethylenedioxythiophene)-Poly(Styrenesulfonate) Thin Films

In this study the as-deposited and heat treated at 423K of conductive blend graphene oxide (GO)/ poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (PEDOT:PSS) thin films was prepared with different PEDOT:PSS concentration (0, 0.25, 0.5, 0.75 and 1)w/w on pre-cleaned glass substrate by spin coater. The XRD analysis indicate the existence of the preffered peak (001) of GO around 2θ=8.24° which is domain in all GO/ PEDOT:PSS films characterized for GO, this result approve the good quality of the PEDOT:PSS dispersion in GO, this peak shifted to the lower 2θ with increasing PEDOT:PSS concentration and after annealing process. The scanning electron microscopy (SEM) images and atomic force microscopy (AFM) clearly show the GO flakes and go to disappear with increasing the PEDOT:PSS concentration.

Electrical Characterisation of Polypyrrole Thin Film Conducting Polymer

It is known that organic acids doped Polypyrrole (PPy) will conduct electricity, and the electrical characteristics of the polymer is presented in this paper. The PPy is deposited on a glass substrate using a spin coater, resulted in a thin film with of 0.0823 μm thickness. The I/V characteristics of the PPy thin film were measured using two-point and four-point probe at room temperature. The finding shows that the I/V characteristic is nonlinear. Comparison between these two methods is further explored, and statistically it shows that there is no mean difference between the two methods. Hence, it helps in designing future experiment to measure I/V characteristics at elevated temperature.

Modeling and the main stages of spin coating process: A review

Spin coating is a technique employed for the deposition of uniform thin films of organic materials in the range of micrometer to nanometer on flat substrates. Typically, a small amount of coating material generally as a liquid is dropped over the substrate center, which is either static or spinning at low speed. The substrate is then rotated at the desired speed and the coating material has been spread by centrifugal force. A device that is used for spin coating is termed a spin coater or just a spinner. The substrate continued to spin and the fluid spins off the boundaries of the substrate until the film is reached the required thickness. The thickness and the characteristics of coated layer (film) are depending on the number of rotations per minute (rpm) and the time of rotation. Therefore, a mathematical model is obtained to clarify the prevalent method controlling thin film fabrication. Viscosity and the concentration of (solution) spin coating material are also affecting the thickness of the substrate. This article reviews spin coating techniques including stages in the coating process such as deposition, spin-up, stable fluid outflow (spin-off), and evaporation. Additionally, the main affecting factors on the film thickness in the coating process are reviewed.

Fast Fabrication of Nanostructured Films Using Nanocolloid Lithography and UV Soft Mold Roller Embossing: Effects of Processing Parameters

We report the fabrication of nanofeatured polymeric films using nanosphere lithography and ultraviolet (UV) soft-mold roller embossing and show an illuminative example of their application to solar cells. To prepare the nanofeatured template, polystyrene nanocolloids of two distinct sizes (900 and 300 nm) were overlaid on silicon substrates using a spin coater. A lab-made soft-mold roller embossing device equipped with a UV light source was adopted. A casting method was employed to replicate the nanofeatured template onto polydimethylsiloxane, which was used as the soft mold. During the embossing procedure, the roller was driven by a step motor and compressed the UV-curable resin against the glass substrate to form the nanofeatured layer, which was subsequently cured by UV radiation. Polymer films with nanoscaled features were thus obtained. The influence of distinct processing variables on the reproducibility of the nanofeatured films was explored. The empirical outcomes demonstrate that UV soft-mold roller embossing offers a simple yet potent way of producing nanofeatured films.

TỔNG HỢP LỚP FILM BÁN DẪN MẦM TINH THỂ ZNO TRÊN KÍNH DẪN TRONG SUỐT ITO VỚI THIẾT BỊ TỰ CHẾ SPIN – COATING

Thiết bị spin coater được thiết kế, chế tạo và ứng dụng để tổng hợp vật liệu màng mỏng đồng nhất trên chất nền phẳng với chi phí phù hợp, dễ sử dụng, khả năng hoạt động ở 2 pha tốc độ với khoảng tốc độ điều chỉnh là 300 - 4800 rpm, độ ổn định tốc độ cao và phù hợp với chất nền phẳng có nhiều hình dạng khác nhau với kích thước tối đa 10 cm. Thiết bị được phát triển trên nền tảng Arduino và công nghệ in nhựa 3D . Film bảng mỏng của vật liệu chất bán dẫn mầm tinh thể ZnO phủ trên đế kính dẫn trong suốt ITO có kích thước 25 mm x 25 mm được tổng hợp bằng thiết bị tự chế spin-coater và phương pháp nhiệt. Các phương pháp phân tích hóa lý hiện đại scanning electron microscopy và x-ray diffraction được áp dụng để nghiên cứu hình thái học và cấu trúc tinh thể của lớp vật liệu. Lớp mầm tinh thể ZnO, là giai đoạn quan trọng trước khi phát triển tinh thể với các hình thù khác nhau ứng dụng trong, điện cực quang điện, thiết bị điện tử quang điện hoá như màn hình cảm ứng, cảm biến, transistor, solar cell.

Binary Self-Assembly of Nanocolloidal Arrays using Concurrent and Sequential Spin Coating Techniques

This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes.