optical absorption and reflection
Recently Published Documents


TOTAL DOCUMENTS

22
(FIVE YEARS 0)

H-INDEX

10
(FIVE YEARS 0)

Author(s):  
M. Srinivasa Reddy ◽  
S. Shankaraiah

<p>Glass with compositions  xLiF–(30−x)Li<sub>2</sub>O –10WO<sub>3</sub>–60B<sub>2</sub>O<sub>3</sub>  for 5 ≤ x ≤ 25 mol% have been prepared using the normal melt quenching technique. The optical absorption and reflection spectra were recorded at room temperature in the wavelength range 300-800 nm. From the absorption edge studies, the values of the optical band gap (E<sub>opt</sub>) and Urbach energy (ΔE) have been evaluated. The values of E<sub>opt</sub> and ΔE vary non-linearly with composition parameter, showing the mixed alkali effect.</p>


2008 ◽  
Vol 92 (8) ◽  
pp. 081902 ◽  
Author(s):  
Daisuke Shimamoto ◽  
Takaaki Sakurai ◽  
Minoru Itoh ◽  
Yoong Ahm Kim ◽  
Takuya Hayashi ◽  
...  

1996 ◽  
Vol 100 (9) ◽  
pp. 3395-3401 ◽  
Author(s):  
James Erik Hendrickson ◽  
William P. Pratt, ◽  
Ching-Tung Kuo ◽  
Qingshan Xie ◽  
James L. Dye

1996 ◽  
Vol 438 ◽  
Author(s):  
N. Kishimoto ◽  
V. T. Gritsyna ◽  
K. Kono ◽  
H. Amekura ◽  
T. Saito

AbstractHigh- current implantation of Cu- ions into silica glasses has been demonstrated using mAclass negative ion beams at 60 keV. Negative ion implantation has an advantage to alleviate specimen charging for insulating substrates and has attained high dose rates, up to 260 μA/cm2. Spherical Cu colloids form in the silica glasses without additional thermal annealing. Optical absorption and reflection of the implanted specimens vary with the current density, even at a fixed dose level. A beam- induced surface plasma may affect the high current implantation.


Sign in / Sign up

Export Citation Format

Share Document