Development of a polystyrene colloidal monolayer processin the technology of microsphere lithography

The study introduces an operation of deposition of a polystyrene microspheres monolayer from a colloidal suspension, based on the Langmuir ― Blodgett method. The operation plays a key role in the technology of microsphere lithography. The paper describes the laboratory equipment developed to produce ordered colloidal films and monolayers, shows the main modes of the process, and presents the results of studying the surfaces of samples using an atomic force microscope. Findings of research show that the films obtained are close-packed monolayers of microspheres in accordance with the hexagonal symmetry, which are suitable to be used as templates. By means of them and by the method of microsphere lithography, it is possible to obtain regular arrays of nanoparticles of a given size for products of photonics, sensorics, and nanoelectronics.

Temporal evolution of concentration and microstructure of colloidal films during vertical drying: a lattice Boltzmann simulation study

Computer simulations of colloidal film drying including hydrodynamic interactions between the particles.

Controlling the drying-induced peeling of colloidal films

Controlling film peeling by modifying the properties of the evaporating solution and consequently the length of the drying front.