scholarly journals Holographic Lithography for Industrial Nanomanufacturing

2020 ◽  
Author(s):  
Beth Zotter ◽  
Keyword(s):  
Holographic Lithography

Holographic Lithography with Endpoint Detection of Resist Development

1993 ◽  
Vol 32 (Part 1, No. 7) ◽  
pp. 3321-3327
Author(s):  
Hiroaki Kawata ◽  
Nobuo Kasamatsu ◽  
Kenji Murata
Keyword(s):  
Holographic Lithography ◽  
Endpoint Detection

scholarly journals Formation principles of two-dimensional compound photonic lattices by one-step holographic lithography

2005 ◽  
Vol 13 (8) ◽  
pp. 2994 ◽  
Author(s):  
W. D. Mao ◽  
J. W. Dong ◽  
Y. C. Zhong ◽  
G. Q. Liang ◽  
H. Z. Wang
Keyword(s):  
Holographic Lithography ◽  
Two Dimensional ◽  
Photonic Lattices ◽  
One Step

Dynamic Maskless Holographic Lithography

2007 ◽  
Author(s):  
Nathan J. Jenness ◽  
Kurt D. Wulff ◽  
Matthew S. Johannes ◽  
Daniel G. Cole ◽  
Robert L. Clark
Keyword(s):  
Cell Patterning ◽  
Pattern Transfer ◽  
Holographic Lithography ◽  
Single Shot ◽  
Recent Application ◽  
Nanoscale Structures ◽  
Maskless Patterning ◽  
Phase Holograms

Maskless patterning techniques are increasingly implemented in semiconductor research and manufacturing eliminating the need for costly masks or masters. Recent application of these techniques to DNA and cell patterning demonstrates the adaptability of maskless processes. In this paper we present a new lithographic process for dynamically reconfiguring and arbitrarily positioning computer-generated patterns through the use of phase holograms. Similar to current maskless patterning methods this process can achieve pattern transfer through serially tracing an image onto a substrate. The novelty of our process, however, lies in the ability to rapidly fabricate complex micro/nanoscale structures through single-shot exposure of a substrate.

Layered nano-gratings by electron beam writing to form 3-level diffractive optical elements for 3D phase-offset holographic lithography

Nanoscale ◽  
2015 ◽  
Vol 7 (47) ◽  
pp. 19905-19913 ◽  
Author(s):  
Liang (Leon) Yuan ◽  
Peter R. Herman
Keyword(s):  
Electron Beam ◽  
Holographic Lithography ◽  
Diffractive Optical Elements ◽  
Optical Elements ◽  
Phase Offset

Three-level nano-grating phase masks fabricated by e-beam lithography provided a diamond-like symmetry in holographic exposure and promised 3D complete stopbands.

scholarly journals TIR Holographic lithography using Surface Relief Hologram Mask

2009 ◽  
Vol 20 (3) ◽  
pp. 175-181 ◽  
Author(s):  
Woo-Jae Park ◽  
Joon-Sub Lee ◽  
Seok-Ho Song ◽  
Sung-Jin Lee ◽  
Tae-Hyun Kim
Keyword(s):  
Surface Relief ◽  
Holographic Lithography

scholarly journals Standing wave in holographic lithography

2012 ◽  
Vol 61 (1) ◽  
pp. 014204
Author(s):  
Qiu Ke-Qiang ◽  
Liu Zheng-Kun ◽  
Xu Xiang-Dong ◽  
Liu Ying ◽  
Hong Yi-Lin ◽  
...  
Keyword(s):  
Standing Wave ◽  
Holographic Lithography

scholarly journals Optimal Source Beam Shaping for Digital Holographic Lithography

2016 ◽  
Author(s):  
M. Shusteff ◽  
J. K. Dudoff ◽  
A. E. M. Browar ◽  
L. A. Shaw ◽  
R. M. Panas ◽  
...  
Keyword(s):  
Beam Shaping ◽  
Holographic Lithography

scholarly journals Chiral microstructures (spirals) fabrication by holographic lithography

2005 ◽  
Vol 13 (19) ◽  
pp. 7615 ◽  
Author(s):  
Yee Kwong Pang ◽  
Jeffrey Chi Wai Lee ◽  
Hung Fai Lee ◽  
Wing Yim Tam ◽  
C. T. Chan ◽  
...  
Keyword(s):  
Holographic Lithography
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