Block Copolymers on a Physically or Chemically Patterned Substrate

Patterned substrates are good candidates to enhance the arrangement of nanodomains in block copolymer thin films. Here, I theoretically demonstrate the possibility to self-assemble block copolymers on top of physically or chemically patterned substrates. The presence of substrate pattern not only enhances the alignment of polymers, but also induces novel new morphologies which were not present in the bulk phase diagram.

The Grain Boundary Wetting in the Sn– 25 at% In Alloys

The grain boundary (GB) wetting was investigated in the Sn – 25 at.% In alloy. It was found that the portion of GBs wetted by the melt depends on the annealing temperature. No GB completely wetted by melt was observed at 140°C, while all GBs were fully wetted after annealing at 180°C. Between 140°C and 180°C the portion of wetted GBs increases with increasing temperature. The tie-lines of GB wetting phase transition were constructed in the Sn–In bulk phase diagram.