Spin‐1 antiferromagnetic Ising model. I. Bulk phase diagram for a binary alloy

1981 ◽  
Vol 74 (1) ◽  
pp. 713-720 ◽  
Author(s):  
Y. Saito
Keyword(s):  
Phase Diagram ◽  
Ising Model ◽  
Binary Alloy ◽  
Bulk Phase ◽  
Bulk Phase Diagram ◽  
Antiferromagnetic Ising Model

Phase diagram of the dilute antiferromagnetic Ising model

1998 ◽  
Vol 244 (1-3) ◽  
pp. 165-168 ◽  
Author(s):  
E.E. Reinehr ◽  
W. Figueiredo
Keyword(s):  
Phase Diagram ◽  
Ising Model ◽  
Antiferromagnetic Ising Model

scholarly journals The magnetic susceptibility on the transverse antiferromagnetic Ising model: Analysis of the reentrant behavior

2016 ◽  
Vol 30 (17) ◽  
pp. 1630011
Author(s):  
Minos A. Neto ◽  
J. Ricardo de Sousa ◽  
Igor T. Padilha ◽  
Octavio D. Rodriguez Salmon ◽  
J. Roberto Viana ◽  
...  
Keyword(s):  
Field Theory ◽  
Phase Diagram ◽  
Magnetic Susceptibility ◽  
Ising Model ◽  
Magnetic Fields ◽  
Effective Field Theory ◽  
Three Dimensional ◽  
Effective Field ◽  
Antiferromagnetic Ising Model ◽  
Reentrant Phenomena

We study the three-dimensional antiferromagnetic Ising model in both uniform longitudinal [Formula: see text] and transverse [Formula: see text] magnetic fields by using the effective-field theory (EFT) with finite cluster [Formula: see text] spin (EFT-1). We analyzed the behavior of the magnetic susceptibility to investigate the reentrant phenomena that we have seen in the same phase diagram previously obtained in other papers. Our results shows the presence of two divergences in the susceptibility that indicates the existence of a reentrant behavior.

Block Copolymers on a Physically or Chemically Patterned Substrate

2010 ◽  
Vol 123-125 ◽  
pp. 523-526
Author(s):  
Jaeup U. Kim
Keyword(s):  
Thin Films ◽  
Phase Diagram ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Bulk Phase ◽  
Patterned Substrates ◽  
Patterned Substrate ◽  
Bulk Phase Diagram

Patterned substrates are good candidates to enhance the arrangement of nanodomains in block copolymer thin films. Here, I theoretically demonstrate the possibility to self-assemble block copolymers on top of physically or chemically patterned substrates. The presence of substrate pattern not only enhances the alignment of polymers, but also induces novel new morphologies which were not present in the bulk phase diagram.

The Grain Boundary Wetting in the Sn– 25 at% In Alloys

2006 ◽  
Vol 258-260 ◽  
pp. 491-496 ◽  
Author(s):  
C.H. Yeh ◽  
L.S. Chang ◽  
Boris B. Straumal
Keyword(s):  
Phase Transition ◽  
Phase Diagram ◽  
Grain Boundary ◽  
Annealing Temperature ◽  
Bulk Phase ◽  
Bulk Phase Diagram ◽  
Tie Lines ◽  
Grain Boundary Wetting ◽  
Increasing Temperature

The grain boundary (GB) wetting was investigated in the Sn – 25 at.% In alloy. It was found that the portion of GBs wetted by the melt depends on the annealing temperature. No GB completely wetted by melt was observed at 140°C, while all GBs were fully wetted after annealing at 180°C. Between 140°C and 180°C the portion of wetted GBs increases with increasing temperature. The tie-lines of GB wetting phase transition were constructed in the Sn–In bulk phase diagram.

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