Providing a Specified Level of Electromagnetic Shielding with Nickel Thin Films Formed by DC Magnetron Sputtering

Nickel films of 4–250 nm thickness were produced by DC magnetron sputtering onto glass and silicon substrates. The electrical properties of the films were investigated by the four-probe method and the surface morphology of the films was studied by atomic force microscopy. To measure the shielding effectiveness, a portable closed stand based on horn antennas was used. A theoretical assessment of the shielding effectiveness of nickel films of various thickness under electromagnetic radiation of a range of frequencies was carried out using two different approximations. The results demonstrate the shielding effectiveness of up to 35 dB of the nickel thin films in the frequency range of 2–18 GHz.

Proximity effect of two-dimensional van der Waals magnet Fe3GeTe2 on nickel films

Recent advances in two-dimensional van der Waals (2D vdW) magnet provide new platforms to study the magnetism in reduced dimensions. However, most of the studies performed to date have been...

LARGE VALUES OF THE TRANSVERSE M UES OF THE TRANSVERSE MAGNETIC RESISTANCEOF SINGLE CRYSTAL NICKEL FILMS

Background. The anisotropy of the transverse magnetoresistance of single-crystal nickel films was studied in this work. The measurements were carried out on samples whose surface plane coincided with the [001] plane. Studies of the magnetoresistance in a single-crystal nickel film have shown the effect of tensile stresses acting on it from the side of magnesium oxide. The modification of the anisotropy of magnetoreflection of a film on a substrate as compared to a free sample is apparently associated with a change in the shape of the Fermi surface of carriers.