FeZrN Films: Magnetic and Mechanical Properties Relative to the Phase-Structural State

The paper presents results of investigation of Fe65.3–100Zr34.7–0N7.5–0 films prepared by dc magnetron deposition on glass substrates and subsequent 1-hour annealing at temperatures of 300–600 °C. The influence of the chemical and phase compositions and structure of the films, which were studied by TEM, SEM, XRD, and GDOES, on their mechanical properties determined by nanoindentation and static magnetic properties measured by VSM method is analyzed. The studied films exhibit the hardness within a range of 14–21 GPa, low elastic modulus (the value can reach 156 Gpa), and an elastic recovery of 55–83%. It was shown that the films are strong ferromagnets with the high saturation induction Bs (up to 2.1 T) and low coercive field Hc (as low as 40 A/m). The correlations between the magnetic and mechanical properties, on one hand, and the chemical composition of the films, their phase, and structural states as well, on the other hand, are discussed.

Advanced processes for low-temperature formation of functional metal oxide based thin films

The analysis the discharge processes in magnetron plasma, target sputtering processes, as well as nucleation and formation of oxide thin films during dc magnetron sputtering is carried out. Particular attention is paid to the phenomenon of instabilities of the current-voltage characteristics of magnetron plasma during the sputtering of oxide targets, the processes of structural transformations of the surface of metal oxide targets under ion bombardment impact, and the mechanisms of low-temperature magnetron deposition of metal oxide thin films. Based on the results of the analysis performed the optimal routes for improving technologies for the low-temperature formation of transparent conductive oxide thin films have been discussed.

Surfacing of Ti-Al System Mechanocomposites by Magnetron Deposition

The investigations of (Ti + Al)-SiO2 surfacing by magnetron deposition are presented in this article. The correlation between film`s thickness deposited on the particles by mechanocomposites and magnetron sputtering time was established. It was determined that the rational time for surfacing by Ti-Al mechanocomposites system is about 40 minutes. According that deposition time the thickness of deposited SiO2 films were obtained as 5.2 microns.

PHYSICAL AND MECHANICAL PROPERTIES OF MULTI-ELEMENT COATINGS

A number of experiments were conducted to measure the physical and mechanical properties of multielement coatings. To apply CrNiTiFeCu coatings on a nickel-chromium substrate, the technology of magnetron deposition in an atmosphere of argon or nitrogen was used. The results of measurements of the microhardness as well as the coefficients of friction and wear resistance of the applied CrNiTiFeCu thin films are presented. The findings indicate that the studied samples show a high microhardness and wear resistance. Consequently, there is a possibility to extend the lifespan of mechanisms and machines parts.

OPTICAL AND MASS SPECTRA FROM REACTIVE PLASMA AT MAGNETRON DEPOSITION OF TANTALUM OXYNITRIDE

Processes in reactive plasma during the magnetron deposition of tantalum oxynitride with ICP activation of reactive gas are studied in dependence on Oxygen fraction. Results of spectroscopic study of optical emission from the plasma and of mass-spectrometry of gas composition in the vacuum chamber in response to ignition of magnetron discharge and inductively coupled plasma are presented. It is shown that dissociation level of all species grows with the magnetron current increase while its dependence on oxygen/nitrogen ratio is non-monotonic.

NITROGEN INFLUENCE ON THE CORROSION RESISTANCE OF THIN Ti-O-N FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING

The electrochemical and gravimetric methods were used to study the effect of nitrogen using in the reaction mixture during magnetron deposition on the Ti-O-N films corrosion-electrochemical behavior. Polarization studies of the films electrochemical dissolution in aque-ous solution of 3 % NaCl in a potentiostatic mode are presented. It was found that upon dis-solution of the films, passivation, activation, and passivation of the coating surface are ob-served, associated with the formation of oxide films and titanium chlorides on the sample sur-face. It has been proved that thin films obtained with a high nitrogen content exhibit higher corrosion resistance. In this work, the following corrosion parameters were calculated: mass, depth and current indicators.

Радиоактивационный контроль плотности износостойких покрытий AlN и CrN на кремнии

In this work, the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by magnetron sputtering were measured, respectively, by a combination of the methods of nondestructive radioactivation analysis on proton beams of the U-120M cyclotron and optical micro-interferometry. It is shown that, at linear thicknesses in the range of 2.2-5.7 μm, the coating density is close to the values for bulk materials AlN (3.26 g / cm3) and CrN (5.9 g / cm3), and the stoichiometry of nitrides is controlled by the parameters of magnetron deposition. The technique can also be used to determine the density of wear-resistant coatings from carbides and metal oxides.

Residual Stresses in Soft Magnetic FeTiB and FeZrN Films Obtained by Magnetron Deposition

The coercive field of soft magnetic ferromagnets is a structure-sensitive property and, in particular, is substantially affected by residual stresses. In the present study, the phase and structural states and residual stresses of the FeTiB and FeZrN films of various compositions, which were prepared by magnetron deposition on glass substrates and subsequent 1-h annealing at temperatures of 200–600 °C, were investigated by X-ray diffraction. The formation of a nanocrystalline structure is observed. It comprises different phases having different lattice parameters and unit-cell volumes and is characterized by high level of microstrains of grains as well; the microstrains predetermine the formation of high compressive stresses in the deposited films. As the annealing temperature increases, the compressive stresses decrease, and, at certain temperatures, gradually the films transform into thermal tensile stresses, which are induced by the difference in the thermal expansion coefficients of the film and substrate. Thus, the heat treatment is the efficient way to improve the soft magnetic properties of the studied class of film materials produced by magnetron deposition.