scholarly journals Structural, Optical and Electrical Properties of N-doped ZnO Nanofilms by Plasma Enhanced Atomic Layer Deposition

2011 ◽  
Vol 49 (3) ◽  
pp. 357-360 ◽  
Author(s):  
Jin-Hwan Kim ◽  
Wan-Youn Yang ◽  
Yoon-Bong Hahn
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Optical And Electrical Properties ◽  
Layer Deposition ◽  
Doped Zno

scholarly journals Optical and electrical properties of H2 plasma-treated ZnO films prepared by atomic layer deposition using supercycles

2018 ◽  
Vol 84 ◽  
pp. 91-100 ◽  
Author(s):  
Prakash Uprety ◽  
Bart Macco ◽  
Maxwell M. Junda ◽  
Corey R. Grice ◽  
Wilhelmus M.M. Kessels ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Films ◽  
Optical And Electrical Properties ◽  
Layer Deposition

Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization

RSC Advances ◽  
2016 ◽  
Vol 6 (69) ◽  
pp. 64879-64884 ◽  
Author(s):  
Ning Li ◽  
Li-ping Feng ◽  
Jie Su ◽  
Wei Zeng ◽  
Zheng-tang Liu
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Optical And Electrical Properties ◽  
Layer Deposition ◽  
Composition Structure

Composition, structure, optical and electrical properties of Al:WS2 (un-doped and Al-doped WS2) films prepared by atomic layer deposition (ALD) and CS2 vulcanization processing have been studied.

scholarly journals Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO

2015 ◽  
Vol 3 (13) ◽  
pp. 3095-3107 ◽  
Author(s):  
Diana Garcia-Alonso ◽  
Stephen E. Potts ◽  
Cristian A. A. van Helvoirt ◽  
Marcel A. Verheijen ◽  
Wilhelmus M. M. Kessels
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Doped Zno

The doping efficiency and hence the electrical properties of atomic layer deposited ZnO can be improved by using a novel, safer boron precursor.

Precise control of the microstructural, optical, and electrical properties of ultrathin Ga2O3 film through nanomixing with few atom-thick SiO2 interlayer via plasma enhanced atomic layer deposition

2018 ◽  
Vol 6 (46) ◽  
pp. 12518-12528 ◽  
Author(s):  
Hong-Ping Ma ◽  
Hong-Liang Lu ◽  
Tao Wang ◽  
Jian-Guo Yang ◽  
Xing Li ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Optical And Electrical Properties ◽  
Precise Control ◽  
Ga2o3 Film ◽  
Layer Deposition ◽  
Quartz Substrates

Ultrathin Ga2O3 films nanomixed with few atom-thick SiO2 interlayer were deposited on silicon and quartz substrates through plasma-enhanced atomic layer deposition.

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