scholarly journals Ultra-thin film microcrystalline silicon with high deposition rate and its application in tandem silicon solar cells

2015 ◽  
Vol 64 (22) ◽  
pp. 228801
Author(s):  
Bai Li-Sha ◽  
Li Tian-Tian ◽  
Liu Bo-Fei ◽  
Huang Qian ◽  
Li Bao-Zhang ◽  
...  
2009 ◽  
Vol 58 (7) ◽  
pp. 5041
Author(s):  
Zhang Xiao-Dan ◽  
Zhao Ying ◽  
Sun Fu-He ◽  
Wang Shi-Feng ◽  
Han Xiao-Yan ◽  
...  

2004 ◽  
Vol 451-452 ◽  
pp. 280-284 ◽  
Author(s):  
M. Lejeune ◽  
W. Beyer ◽  
R. Carius ◽  
J. Müller ◽  
B. Rech

2011 ◽  
Vol 1321 ◽  
Author(s):  
Peter Cuony ◽  
Duncan T.L. Alexander ◽  
Linus Löfgren ◽  
Michael Krumrey ◽  
Michael Marending ◽  
...  

ABSTRACTLower absorption, lower refractive index and tunable resistance are three advantages of doped silicon oxide containing nanocrystalline silicon grains (nc-SiOx) compared to doped microcrystalline silicon, for the use as p- and n-type layers in thin-film silicon solar cells. In this study we show how optical, electrical and microstructural properties of nc-SiOx layers depend on precursor gas ratios and we propose a growth model to explain the phase separation in such films into Si-rich and O-rich regions as visualized by energy-filtered transmission electron microscopy.


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