scholarly journals Influences of the multiple electron overtaking on the bunching process of the wide-gap klystron amplifier under high power injection condition

2013 ◽  
Vol 62 (5) ◽  
pp. 058402
Author(s):  
Bai Xian-Chen ◽  
Yang Jian-Hua ◽  
Zhang Jian-De ◽  
Jin Zhen-Xing
Keyword(s):  
High Power ◽  
Injection Condition ◽  
Power Injection ◽  
Wide Gap

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

2010 ◽  
Author(s):  
Masaya Yoshino ◽  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
...  
Keyword(s):  
High Power ◽  
Double Exposure ◽  
Immersion Lithography ◽  
Power Injection ◽  
Double Patterning

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

2008 ◽  
Author(s):  
Takahito Kumazaki ◽  
Toru Suzuki ◽  
Satoshi Tanaka ◽  
Ryoichi Nohdomi ◽  
Masaya Yoshino ◽  
...  
Keyword(s):  
High Power ◽  
Immersion Lithography ◽  
Power Injection
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