scholarly journals Numerical simulation of enhanced glow discharge plasma immersion ion implantation using three-dimensional PIC/MC model

2012 ◽  
Vol 61 (22) ◽  
pp. 225203
Author(s):  
He Fu-Shun ◽  
Li Liu-He ◽  
Li Fen ◽  
Dun Dan-Dan ◽  
Tao Chan-Cai
2009 ◽  
Vol 95 (6) ◽  
pp. 061503 ◽  
Author(s):  
Qiu Yuan Lu ◽  
Liu He Li ◽  
Jian Hui Li ◽  
Ricky K. Y. Fu ◽  
Paul K. Chu

2000 ◽  
Vol 647 ◽  
Author(s):  
S. Miyagawa ◽  
Y. Miyagawa

AbstractPlasma based ion implantation (PBII) with bipolar high voltage pulses has been proposed to improve a dose uniformity in an ion implantation on a three-dimensional target. A pulsed glow discharge plasma is produced around the target by a positive high-voltage pulse, and then ions are implanted into the target from all sides by the subsequent negative high-voltage pulse. A time resolved plasma density and the spatial profiles of the pulsed glow discharge plasma are measured by a Langmuir probe in a boxcar mode, and diamond like carbon (DLC) films are deposited under optimal conditions of the pulsed plasma. It is shown that the PBII with bipolar pulses is a useful method in depositing DLC films on the three-dimensional target. A carbon ion implantation procedure results in the enhanced adherence of DLC coating to the target, and the enhanced adhesion is due to a graded carbon interface produced by carbon implantation.


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