Numerical study on uniformity of electron cyclotron resonance plasma density

Gao Bi-Rong;  Liu Yue

doi:10.7498/aps.60.045201

Numerical study on uniformity of electron cyclotron resonance plasma density

Acta Physica Sinica ◽

10.7498/aps.60.045201 ◽

2011 ◽

Vol 60 (4) ◽

pp. 045201

Author(s):

Gao Bi-Rong ◽

Liu Yue

Keyword(s):

Plasma Density ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Numerical Study ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Modeling of plasma density, argon ion energy and ion velocity functions in a dipolar electron cyclotron resonance plasma source

Vacuum ◽

10.1016/j.vacuum.2020.109215 ◽

2020 ◽

Vol 174 ◽

pp. 109215

Author(s):

Bin Zhang ◽

Xiaobing Zhang

Keyword(s):

Plasma Density ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Ion Energy ◽

Ion Velocity ◽

Argon Ion ◽

Resonance Plasma

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Influence of microwave driver coupling design on plasma density at Testbench for Ion sources Plasma Studies, a 2.45 GHz Electron Cyclotron Resonance Plasma Reactor

Review of Scientific Instruments ◽

10.1063/1.4869343 ◽

2014 ◽

Vol 85 (3) ◽

pp. 033310 ◽

Cited By ~ 12

Author(s):

A. Megía-Macías ◽

O. D. Cortázar ◽

A. Vizcaíno-de-Julián

Keyword(s):

Plasma Density ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Ion Sources ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar

Applied Physics Letters ◽

10.1063/1.102487 ◽

1990 ◽

Vol 56 (15) ◽

pp. 1424-1426 ◽

Cited By ~ 52

Author(s):

S. J. Pearton ◽

U. K. Chakrabarti ◽

A. P. Kinsella ◽

D. Johnson ◽

C. Constantine

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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X-ray photoelectron diffraction observation of β-SiC(001) obtained by electron cyclotron resonance plasma assisted growth on Si(001)

Applied Surface Science ◽

10.1016/0169-4332(93)90239-8 ◽

1993 ◽

Vol 68 (4) ◽

pp. 575-582 ◽

Cited By ~ 20

Author(s):

M. Diani ◽

J.L. Bischoff ◽

L. Kubler ◽

D. Bolmont

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

X Ray ◽

Photoelectron Diffraction ◽

Resonance Plasma

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Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Cited By ~ 20

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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Deposition of high‐quality TiN using tetra‐isopropoxide titanium in an electron cyclotron resonance plasma process

Applied Physics Letters ◽

10.1063/1.114847 ◽

1995 ◽

Vol 67 (20) ◽

pp. 2934-2935 ◽

Cited By ~ 19

Author(s):

A. Weber ◽

R. Poeckelmann ◽

C.‐P. Klages

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Plasma Process ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Low-damage electron-beam-assisted dry etching of GaAs and AlGaAs using electron cyclotron resonance plasma electron source

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586892 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2288 ◽

Cited By ~ 4

Author(s):

Heiji Watanabe

Keyword(s):

Electron Beam ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Dry Etching ◽

Plasma Electron ◽

Electron Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Electron Source ◽

Resonance Plasma

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c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Cited By ~ 7

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Film Substrate ◽

Resonance Plasma

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Temperature and density evolution during decay in a 2.45 GHz hydrogen electron cyclotron resonance plasma: Off-resonant and resonant cases

Review of Scientific Instruments ◽

10.1063/1.4819875 ◽

2013 ◽

Vol 84 (9) ◽

pp. 093301 ◽

Cited By ~ 6

Author(s):

O. D. Cortázar ◽

A. Megía-Macías ◽

A. Vizcaíno-de-Julián

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Density Evolution ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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