scholarly journals Frictional properties of fluorinated diamond-like carbon films prepared by radio frequency reactive magnetron sputtering

2010 ◽  
Vol 59 (12) ◽  
pp. 8920
Author(s):  
Wang Pei-Jun ◽  
Jiang Mei-Fu ◽  
Du Ji-Long ◽  
Dai Yong-Feng
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Carbon Films ◽  
Reactive Magnetron Sputtering ◽  
Diamond Like Carbon ◽  
Reactive Magnetron ◽  
Frictional Properties

Structure of diamond-like carbon films containing transition metals deposited by reactive magnetron sputtering

2005 ◽  
Vol 14 (3-7) ◽  
pp. 1103-1107 ◽  
Author(s):  
C. Corbella ◽  
G. Oncins ◽  
M.A. Gómez ◽  
M.C. Polo ◽  
E. Pascual ◽  
...  
Keyword(s):  
Transition Metals ◽  
Magnetron Sputtering ◽  
Carbon Films ◽  
Reactive Magnetron Sputtering ◽  
Diamond Like Carbon ◽  
Reactive Magnetron

Composition and morphology of metal-containing diamond-like carbon films obtained by reactive magnetron sputtering

2005 ◽  
Vol 482 (1-2) ◽  
pp. 293-298 ◽  
Author(s):  
C. Corbella ◽  
E. Pascual ◽  
G. Oncins ◽  
C. Canal ◽  
J.L. Andújar ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Reactive Magnetron Sputtering ◽  
Diamond Like Carbon ◽  
Reactive Magnetron

Deposition and properties of ZrNx films produced by radio frequency reactive magnetron sputtering

2006 ◽  
Vol 515 (4) ◽  
pp. 1486-1493 ◽  
Author(s):  
A. Rizzo ◽  
M. A. Signore ◽  
L. Mirenghi ◽  
D. Dimaio
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

2007 ◽  
Vol 124-126 ◽  
pp. 999-1002 ◽  
Author(s):  
Han Na Cho ◽  
Jang Woo Lee ◽  
Su Ryun Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Visible Region ◽  
Film Surface ◽  
Optical Transmittance ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Indium Zinc Oxide

Indium zinc oxide (IZO) thin films were deposited on a glass substrate by radio frequency (rf) reactive magnetron sputtering method. As the rf power increased, the deposition rate and resistivity increased while the optical transmittance decreased owing to the increase of grain size. With increasing gas pressure, the resistivity increased and the transmittance decreased. Atomic force microscopy and scanning electron microscopy were employed to observe the film surface. The IZO films displayed a resistivity of 3.8 × 10-4 Ω cm and a transmittance of about 90% in visible region.

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