Deposition and properties of ZrNx films produced by radio frequency reactive magnetron sputtering

2006 ◽  
Vol 515 (4) ◽  
pp. 1486-1493 ◽  
Author(s):  
A. Rizzo ◽  
M. A. Signore ◽  
L. Mirenghi ◽  
D. Dimaio
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

2007 ◽  
Vol 124-126 ◽  
pp. 999-1002 ◽  
Author(s):  
Han Na Cho ◽  
Jang Woo Lee ◽  
Su Ryun Min ◽  
Chee Won Chung
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Visible Region ◽  
Film Surface ◽  
Optical Transmittance ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Indium Zinc Oxide

Indium zinc oxide (IZO) thin films were deposited on a glass substrate by radio frequency (rf) reactive magnetron sputtering method. As the rf power increased, the deposition rate and resistivity increased while the optical transmittance decreased owing to the increase of grain size. With increasing gas pressure, the resistivity increased and the transmittance decreased. Atomic force microscopy and scanning electron microscopy were employed to observe the film surface. The IZO films displayed a resistivity of 3.8 × 10-4 Ω cm and a transmittance of about 90% in visible region.

Effects of oxygen addition on physical properties of ZnO thin film grown by radio frequency reactive magnetron sputtering

2011 ◽  
Vol 509 (5) ◽  
pp. 1774-1776 ◽  
Author(s):  
Che-Wei Hsu ◽  
Tsung-Chieh Cheng ◽  
Chun-Hui Yang ◽  
Yi-Ling Shen ◽  
Jong-Shinn Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Physical Properties ◽  
Reactive Magnetron Sputtering ◽  
Zno Thin Film ◽  
Reactive Magnetron ◽  
Oxygen Addition
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