A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVD

Zhang Xiao-Dan;  Zhao Ying;  Zhu Feng;  Wei Chang-Chun;  Wu Chun-Ya;  Gao Yan-Tao;  Hou Guo-Fu;  Sun Jian;  Geng Xin-Hua;  Xiong Shao-Zhen

doi:10.7498/aps.54.445

A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVD

Acta Physica Sinica ◽

10.7498/aps.54.445 ◽

2005 ◽

Vol 54 (1) ◽

pp. 445

Author(s):

Zhang Xiao-Dan ◽

Zhao Ying ◽

Zhu Feng ◽

Wei Chang-Chun ◽

Wu Chun-Ya ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Silicon Films ◽

Microcrystalline Silicon

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An optical emission spectroscopy study on the high rate growth of microcrystalline silicon films

Acta Physica Sinica ◽

10.7498/aps.58.1344 ◽

2009 ◽

Vol 58 (2) ◽

pp. 1344

Author(s):

Han Xiao-Yan ◽

Geng Xin-Hua ◽

Hou Guo-Fu ◽

Zhang Xiao-Dan ◽

Li Gui-Jun ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Silicon Films ◽

High Rate ◽

Spectroscopy Study ◽

Microcrystalline Silicon

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Optical emission spectroscopy investigation on very high frequency plasma and its glow discharge mechanism during the microcrystalline silicon deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.06.130 ◽

2005 ◽

Vol 472 (1-2) ◽

pp. 125-129 ◽

Cited By ~ 28

Author(s):

Huidong Yang ◽

Chunya Wu ◽

Junkai Huang ◽

Ruiqin Ding ◽

Ying Zhao ◽

...

Keyword(s):

Glow Discharge ◽

High Frequency ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Microcrystalline Silicon ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Very High

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Optical emission spectroscopy study on deposition process of microcrystalline silicon

Chinese Physics ◽

10.1088/1009-1963/15/11/042 ◽

2006 ◽

Vol 15 (11) ◽

pp. 2713-2717 ◽

Cited By ~ 3

Author(s):

Wu Zhi-Meng ◽

Lei Qing-Song ◽

Geng Xin-Hua ◽

Zhao Ying ◽

Sun Jian ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Deposition Process ◽

Spectroscopy Study ◽

Microcrystalline Silicon

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Optical emission spectroscopy study toward high rate growth of microcrystalline silicon

Thin Solid Films ◽

10.1016/s0040-6090(00)01677-1 ◽

2001 ◽

Vol 386 (2) ◽

pp. 256-260 ◽

Cited By ~ 34

Author(s):

Yusuke Fukuda ◽

Yoshikazu Sakuma ◽

Chisato Fukai ◽

Yukihiro Fujimura ◽

Kazufumi Azuma ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

High Rate ◽

Spectroscopy Study ◽

Microcrystalline Silicon

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Analysis on pressure dependence of microcrystalline silicon by optical emission spectroscopy

Physica E Low-dimensional Systems and Nanostructures ◽

10.1016/j.physe.2005.12.165 ◽

2006 ◽

Vol 33 (1) ◽

pp. 125-129 ◽

Cited By ~ 7

Author(s):

Zhimeng Wu ◽

Jian Sun ◽

Qingsong Lei ◽

Ying Zhao ◽

Xinhua Geng ◽

...

Keyword(s):

Pressure Dependence ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Microcrystalline Silicon

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Optical emission spectroscopy characterization of a hydrogen diluted silane plasma for microcrystalline silicon thin film deposition

2009 IEEE International Conference on Plasma Science - Abstracts ◽

10.1109/plasma.2009.5227387 ◽

2009 ◽

Author(s):

C. H. Chang ◽

C. C. Du ◽

K. C. Chen ◽

J. R. Huang ◽

Y. L. Chang ◽

...

Keyword(s):

Thin Film ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Thin Film Deposition ◽

Film Deposition ◽

Microcrystalline Silicon ◽

Silicon Thin Film ◽

Silane Plasma

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From amorphous to microcrystalline silicon deposition in SiF4–H2–He plasmas: in situ control by optical emission spectroscopy

Thin Solid Films ◽

10.1016/s0040-6090(00)01584-4 ◽

2001 ◽

Vol 383 (1-2) ◽

pp. 203-205 ◽

Cited By ~ 12

Author(s):

G. Cicala ◽

P. Capezzuto ◽

G. Bruno

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Microcrystalline Silicon ◽

Silicon Deposition ◽

In Situ Control

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Evolution of a-Si:H to nc-Si:H transition of hydrogenated silicon films deposited by trichlorosilane using principle component analysis of optical emission spectroscopy

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2019.122186 ◽

2020 ◽

Vol 240 ◽

pp. 122186 ◽

Cited By ~ 2

Author(s):

Song-Ho Wang ◽

Hsueh-Er Chang ◽

Chien-Chieh Lee ◽

Yiin-Kuen Fuh ◽

Tomi T. Li

Keyword(s):

Principle Component Analysis ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Component Analysis ◽

Silicon Films ◽

Hydrogenated Silicon ◽

Principle Component

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Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

Thin Solid Films ◽

10.1016/j.tsf.2011.08.110 ◽

2012 ◽

Vol 520 (11) ◽

pp. 3999-4002 ◽

Cited By ~ 3

Author(s):

C.C. Du ◽

T.C. Wei ◽

C.H. Chang ◽

S.L. Lee ◽

M.W. Liang ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Control Tool

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Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy

Acta Physica Sinica ◽

10.7498/aps.62.168103 ◽

2013 ◽

Vol 62 (16) ◽

pp. 168103

Author(s):

Fang Jia ◽

Li Shuang-Liang ◽

Xu Sheng-Zhi ◽

Wei Chang-Chun ◽

Zhao Ying ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

High Rate ◽

Plasma Process ◽

Microcrystalline Silicon

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