scholarly journals Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy

2013 ◽  
Vol 62 (16) ◽  
pp. 168103
Author(s):  
Fang Jia ◽  
Li Shuang-Liang ◽  
Xu Sheng-Zhi ◽  
Wei Chang-Chun ◽  
Zhao Ying ◽  
...  
2001 ◽  
Vol 386 (2) ◽  
pp. 256-260 ◽  
Author(s):  
Yusuke Fukuda ◽  
Yoshikazu Sakuma ◽  
Chisato Fukai ◽  
Yukihiro Fujimura ◽  
Kazufumi Azuma ◽  
...  

2009 ◽  
Vol 58 (2) ◽  
pp. 1344
Author(s):  
Han Xiao-Yan ◽  
Geng Xin-Hua ◽  
Hou Guo-Fu ◽  
Zhang Xiao-Dan ◽  
Li Gui-Jun ◽  
...  

2008 ◽  
Vol 516 (14) ◽  
pp. 4633-4638 ◽  
Author(s):  
T. Kilper ◽  
M.N. van den Donker ◽  
R. Carius ◽  
B. Rech ◽  
G. Bräuer ◽  
...  

2006 ◽  
Vol 15 (11) ◽  
pp. 2713-2717 ◽  
Author(s):  
Wu Zhi-Meng ◽  
Lei Qing-Song ◽  
Geng Xin-Hua ◽  
Zhao Ying ◽  
Sun Jian ◽  
...  

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