scholarly journals Ordered nanostructures on La-Sr-Cu-O thin films deposited by pulsed electron beam technique

2005 ◽  
Vol 54 (6) ◽  
pp. 2843
Author(s):  
Chen Lei-Ming ◽  
Li Pei-Gang ◽  
Fu Xiu-Li ◽  
Zhang Hai-Ying ◽  
Li Ling-Hong ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Pulsed Electron Beam ◽  
Ordered Nanostructures ◽  
Beam Technique

scholarly journals Poly(propylene)/carbon composite thin films obtained by pulsed electron-beam deposition

2018 ◽  
Vol 15 (7) ◽  
pp. 1700239 ◽  
Author(s):  
Roman Jędrzejewski ◽  
Joanna Piwowarczyk ◽  
Anna Jędrzejewska ◽  
Konrad Kwiatkowski ◽  
Jolanta Baranowska
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Carbon Composite ◽  
Composite Thin Films ◽  
Pulsed Electron Beam ◽  
Electron Beam Deposition ◽  
Poly Propylene ◽  
Propylene Carbon ◽  
Beam Deposition ◽  
Pulsed Electron Beam Deposition

scholarly journals Modeling of Plasma Expansion during Pulsed Electron Beam Ablation of Graphite

MRS Advances ◽  
2017 ◽  
Vol 2 (16) ◽  
pp. 905-911 ◽  
Author(s):  
Muddassir Ali ◽  
Redhouane Henda
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Plasma Plume ◽  
Target Material ◽  
Film Deposition ◽  
Plasma Expansion ◽  
Plume Expansion ◽  
Gas Dynamics Equations ◽  
Reduced Pressure ◽  
Pulsed Electron Beam

ABSTRACTPulsed electron beam ablation (PEBA) has proven to be a promising and powerful technique for the growth of high quality thin films. Pulsed electron beam film deposition consists of many physical processes including target material heating, target ablation, plasma plume expansion, and film growth on a substrate. Plasma plume expansion into a vacuum or an ambient gas is a fundamental issue in PEBA as the quality of thin films deposited onto the substrate depends on the composition, energy and density of particles ejected from the target. In the present study, gas-dynamics equations are solved to investigate plasma expansion induced by interaction of a nanosecond electron beam pulse (∼100 ns) with a graphite target in an argon atmosphere at reduced pressure. The spatio-temporal profiles of the temperature, pressure, velocity, and density of the plasma plume are numerically simulated for a beam efficiency of 0.6 and accelerating voltage of 15 kV. The preliminary results show a rich variety of behaviors. The model is validated by comparing some of the obtained simulation results with experimental data available in the literature.

scholarly journals Deposition Of Oxide And Intermetallic Thin Films By Pulsed Laser (PLD) And Electron Beam (PED) Methods

2015 ◽  
Vol 60 (3) ◽  
pp. 2173-2182 ◽  
Author(s):  
J. Kusiński ◽  
A. Kopia ◽  
Ł. Cieniek ◽  
S. Kąc ◽  
A. Radziszewska
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Pulsed Laser ◽  
Nanocrystalline Structure ◽  
X Ray Diffraction ◽  
Pulsed Electron Beam ◽  
Force Microscopy ◽  
Atomic Force ◽  
Basic Parameters ◽  
Selection Of

Abstract In this work the pulsed laser deposition (PLD) and the pulsed electron beam deposition (PED) techniques were used for fabrication of Mo-Bi2O3, La1−xSrxCoO3, La1−xCaxCoO3 and Al-Mg thin films. An influence of ablation process basic parameters on the coatings structure and properties was discussed. Two types of laser ablation systems were applied: one equipped with a KrF excimer and second with a Q-switched Nd:YAG. Films were deposited on Si and MgO substrates. Scanning (SEM) and transmission (TEM) electron microscopy, atomic force microscopy (AFM) as well as X-ray diffraction (XRD) were used for structural analysis. Investigations focused on structure and chemical composition showed that smooth and dense thin films with nanocrystalline structure, preserving the composition of the bulk target, could be obtained by the both PLD and PED techniques. Research study showed that by a proper selection of PLD and PED process parameters it was possible to deposit films with significantly decreased amount and size of undesirably nanoparticulates.

Polytetrafluoroethylene thin films obtained by the pulsed electron beam deposition method at different gas pressures

Polimery ◽  
2017 ◽  
Vol 62 (10) ◽  
pp. 743-749 ◽  
Author(s):  
Roman Jedrzejewski ◽  
Joanna Piwowarczyk ◽  
Konrad Kwiatkowski ◽  
Jolanta Baranowska
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Deposition Method ◽  
Pulsed Electron Beam ◽  
Electron Beam Deposition ◽  
Beam Deposition ◽  
Gas Pressures ◽  
Pulsed Electron Beam Deposition

The characteristic X-ray spectra of free atoms of metals

Open Physics ◽  
2003 ◽  
Vol 1 (2) ◽  
Author(s):  
P. Antsiferov
Keyword(s):  
Electron Beam ◽  
Solid State ◽  
Atomic Structure ◽  
Simple Technique ◽  
Structure Calculation ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Free Atoms ◽  
Beam Technique

AbstractThe article presents the results of a study of characteristic X-ray spectra of free atoms by means of a new simple technique. A pulsed electron beam was used for evaporation and to create inner-shell vacancies in free atoms of metals. The spectra were obtained with the help of an X-ray monochromator which allowed precise comparison between the free-atoms spectra and corresponding solid-state spectra. The shifts of the peaks were measured and found to be in the range Δλ/λ≈10−5–10−4. The K-, L- and M-series spectra were studied. A number of the free-atoms spectra revealed structure which was not resolved in the solid-state spectra and which is of interest for atomic structure calculation applications. This electron beam technique for the investigation of X-ray characteristic spectra of free atoms can be used for the refinement of X-ray wavelength standards.

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