The characteristic X-ray spectra of free atoms of metals

Open Physics ◽  
2003 ◽  
Vol 1 (2) ◽  
Author(s):  
P. Antsiferov
Keyword(s):  
Electron Beam ◽  
Solid State ◽  
Atomic Structure ◽  
Simple Technique ◽  
Structure Calculation ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Free Atoms ◽  
Beam Technique

AbstractThe article presents the results of a study of characteristic X-ray spectra of free atoms by means of a new simple technique. A pulsed electron beam was used for evaporation and to create inner-shell vacancies in free atoms of metals. The spectra were obtained with the help of an X-ray monochromator which allowed precise comparison between the free-atoms spectra and corresponding solid-state spectra. The shifts of the peaks were measured and found to be in the range Δλ/λ≈10−5–10−4. The K-, L- and M-series spectra were studied. A number of the free-atoms spectra revealed structure which was not resolved in the solid-state spectra and which is of interest for atomic structure calculation applications. This electron beam technique for the investigation of X-ray characteristic spectra of free atoms can be used for the refinement of X-ray wavelength standards.

Deposition of Cobalt Doped Zinc Oxide Thin Film Nano-Composites Via Pulsed Electron Beam Ablation

MRS Advances ◽  
2016 ◽  
Vol 1 (6) ◽  
pp. 433-439 ◽  
Author(s):  
Asghar Ali ◽  
Patrick Morrow ◽  
Redhouane Henda ◽  
Ragnar Fagerberg
Keyword(s):  
Zinc Oxide ◽  
Electron Beam ◽  
Binding Energy ◽  
Photoelectron Spectroscopy ◽  
Xrd Analysis ◽  
Sem Analysis ◽  
Oxide Thin Film ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Deposited Films

AbstractThis study reports on the preparation of cobalt doped zinc oxide (Co:ZnO) films via pulsed electron beam ablation (PEBA) from a single target containing 20 w% Co on sapphire (0001) and silicon (100) substrates. The films have been deposited at various temperatures (350оC, 400оC, 450оC) and pulse frequencies (2 Hz, 4 Hz), under a background argon (Ar) pressure of about 3 mtorr, and an accelerating voltage of 14 kV. The surface morphology has been examined by atomic force microscopy (AFM) and scanning electron microscopy (SEM). According to SEM analysis, the films consist of nano-globules whose size is in the range of 80-178 nm. Energy dispersive x-ray spectroscopy (EDX) reveals that deposition is congruent and the prepared films contain ∼20±5 w% cobalt. It has been found that the nano-globules in the deposited films are cobalt-rich zones containing ∼70 w% Co. From x-ray photoelectron spectroscopy (XPS) analysis, Co 2p3/2 peaks indicate that the deposited films contain CoO (binding energy = 780.5 eV) as well as metallic Co (binding energy = 778.1-778.5 eV). X-ray diffraction (XRD) analysis supports the presence of metallic Co hcp phase (2ϴ = 44.47° and 47.43°) in the films.

Influence of Electron Beam Pulsed Times on the Properties of 40Cr

2010 ◽  
Vol 154-155 ◽  
pp. 1170-1177
Author(s):  
Yuan Fang Chen ◽  
Xiao Dong Peng ◽  
Jian Jun Hu ◽  
Hong Bin Xu ◽  
Chan Hao
Keyword(s):  
Surface Roughness ◽  
Wear Resistance ◽  
Corrosion Resistance ◽  
Electron Beam ◽  
High Current ◽  
Wear Properties ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Surface Microstructures ◽  
40Cr Steel

Surface modification of 40Cr steel by high current pulsed electron beam has been investigated . The pulsed times of HCPEB was changed from 1 to 25 to prepare different specimens. Surface microstructures and section microstructures after HCPEB irradiation were detected by using metallurgical microscope, SEM and X-ray diffractometer. It is shown that crater defects were found on the surface after the irradiation of HCPEB and the density of craters will decrease with increasing pulses times. When treated by 27Kev accelerating voltage, with increasing pulse times, the particles located in surface layer were obviously refined .The surface roughness, hardness, wear properties and corrosion resistance were analyzed after irradiation of HCPEB. The wear resistance and corrosion resistance were obviously enhanced after 10 pulses treatment.

scholarly journals X-ray microanalysis of silumin subjected to intense pulsed electron beam treatment

2019 ◽  
Vol 1393 ◽  
pp. 012113
Author(s):  
E A Petrikova ◽  
A D Teresov ◽  
O S Tolkachov ◽  
Yu F Ivanov ◽  
E A Petrikova ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Treatment ◽  
X Ray ◽  
Pulsed Electron Beam

scholarly journals Laser-Driven Ultrashort Pulsed Electron Beam Radiation at Doses of 0.5 and 1.0 Gy Induces Apoptosis in Human Fibroblasts

2019 ◽  
Vol 20 (20) ◽  
pp. 5140 ◽  
Author(s):  
Nelly Babayan ◽  
Bagrat Grigoryan ◽  
Lusine Khondkaryan ◽  
Gohar Tadevosyan ◽  
Natalya Sarkisyan ◽  
...  
Keyword(s):  
Cell Death ◽  
Electron Beam ◽  
Human Fibroblasts ◽  
Lung Fibroblasts ◽  
Particle Accelerators ◽  
X Rays ◽  
Beam Radiation ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Γh2ax Foci

Rapidly evolving laser technologies have led to the development of laser-generated particle accelerators as an alternative to conventional facilities. However, the radiobiological characteristics need to be determined to enhance their applications in biology and medicine. In this study, the radiobiological effects of ultrashort pulsed electron beam (UPEB) and X-ray radiation in human lung fibroblasts (MRC-5 cell line) exposed to doses of 0.1, 0.5, and 1 Gy are compared. The changes of γH2AX foci number as a marker of DNA double-strand breaks (DSBs) were analyzed. In addition, the micronuclei induction and cell death via apoptosis were studied. We found that the biological action of UPEB-radiation compared to X-rays was characterized by significantly slower γH2AX foci elimination (with a dose of 1 Gy) and strong apoptosis induction (with doses of 0.5 and 1.0 Gy), accompanied by a slight increase in micronuclei formation (dose of 1 Gy). Our data suggest that UPEB radiation produces more complex DNA damage than X-ray radiation, leading to cell death rather than cytogenetic disturbance.

The effect of high-current pulsed electron beam modification on the surface wetting property of polyamide 6

e-Polymers ◽  
2017 ◽  
Vol 17 (1) ◽  
pp. 23-29 ◽  
Author(s):  
Yuan Fang Chen ◽  
Tao Zhang ◽  
Meng Tang ◽  
Ding Xie ◽  
Qian Long ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photoelectron Spectroscopy ◽  
Polyamide 6 ◽  
High Current ◽  
Surface Wetting ◽  
Water Contact ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Wetting Property ◽  
Scanning Electron

AbstractThis study demonstrates that different modification pulse voltages affect the wetting property of the surface of polyamide 6 (PA6) with a certain regularity. Broadly, the hydrophilic property of PA6’s surface increases with increasing pulsed voltage. Based on scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analysis, this paper discusses the mechanism by which high current pulsed electron beam (HCPEB) etching modification influences the surface wettability of PA6. Within a certain range below 28 kV, this effect is caused by an increase of in surface roughness due to HCPEB bombardment of the surface. Within a certain range above 28 kV, HCPEB changes the surface morphology, resulting in changes to the wetting property. Furthermore, by using various pulsed voltages to modify the PA6 surface, this study investigated the ability of the Wenzel model to explain changes in the water contact angle and wetting property of PA6’s surface.

Formation of Surface Nanoaustenite and Properties of 3Cr13 Steel Induced by Pulsed Electron Beam Irradiation under Melting Mode

2013 ◽  
Vol 787 ◽  
pp. 363-366
Author(s):  
Le Ji ◽  
Jie Cai ◽  
Shi Chao Liu ◽  
Zai Qiang Zhang ◽  
Xiu Li Hou ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Irradiation ◽  
Martensitic Stainless Steel ◽  
Material Surface ◽  
X Ray Diffraction ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Boundary Triple ◽  
Melted Layer ◽  
Carbide Particles

The surface of 3Cr13 martensitic stainless steel was irradiated by high current pulsed electron beam (HCPEB). The microstructures of the irradiation surface were characterized by X-ray diffraction and electron microscopy. After HCPEB irradiation, formation of a melting layer with depth of about 4 μm on the irradiated surface was determined. Further microstructural investigations indicate that the surface melted layer consists of nanoaustenite and ultrafine carbide particles, which primarily appear at grain boundary triple junction. Additionally, the microhardness and corrosion resistance of the irradiated surfaces was improved significantly. The formation of the nanoaustenite layer induced by HCPEB irradiation was believed to be the dominating reasons for the improvement of comprehensive performance of the material surface.

scholarly journals ANALYSIS OF CHANGES IN THE PHASE AND STRUCTURAL STATE OF AN ALUMINUM ALLOY 1933 SURFACE LAYER, MELTED BY A PULSED ELECTRON BEAM

2020 ◽  
pp. 33-38
Author(s):  
D.E. Myla ◽  
V.V. Bryukhovetsky ◽  
V.V. Lytvynenko ◽  
V.P. Poyda ◽  
A.V. Poyda ◽  
...  
Keyword(s):  
Surface Layer ◽  
Aluminum Alloy ◽  
Electron Beam ◽  
Magnesium Oxide ◽  
Phase Changes ◽  
Impact Action ◽  
X Ray ◽  
Pulsed Electron Beam ◽  
Developed Surface ◽  
The Impact

The structural and phase changes in the surface layer of an aluminum alloy 1933 caused by the action of a relativistic pulsed electron beam are studied. The structural and phase state of this layer is determined by the impact action of the electron beam and by the kinetics of crystallization from the melt under ultrafast cooling. The impact of a pulsed electron beam is accompanied by the formation of a developed surface relief and the appearance of microcracks on it. The structure of the modified layer is nonequilibrium. X-ray diffraction studies and the results of energy dispersive X-ray microanalysis made it possible to determine that magnesium oxide inclusions are present in the remelted layer. MgO inclusions are generally uniformly distributed in the remelted layer. The maximum size of MgO inclusions does not exceed 1 μm. The causes and mechanisms of the formation of magnesium oxide during the action of a pulsed electron beam are discussed.

Demonstration of Arrays of Sub-Micrometer Solid-State Fresnel Lenses for Electrons

2000 ◽  
Vol 636 ◽  
Author(s):  
Y. Ito ◽  
A. L. Bleloch ◽  
L. M. Brown
Keyword(s):  
Electron Beam ◽  
Solid State ◽  
Electron Beam Lithography ◽  
Full Width Half Maximum ◽  
Focal Point ◽  
Focal Length ◽  
Full Width ◽  
Electron Wave ◽  
X Ray ◽  
Fresnel Lenses

AbstractWe demonstrate the focusing action of a compact solid state pixelated Fresnel phase (PFP) lens for electrons (700 nm in diameter), consisting of an array of holes (“pixelated”) directly drilled by a finely focused electron beam in a thin AlF3 thin film on carbon supporting film. The depths of holes, hence the phase of the exit electron wave is varied as a function of radius from the center of the pattern so that the wavelet from each hole can be in phase on axis at a designated focal point thus producing a lens. An array of two types of lenses, convergent and divergent, with nominal focal length of 1 mm for 200 keV electrons was produced. The estimated full-width-half-maximum of the focus is 8 nm. With improvement of the efficiency, these lenses may find applications in parallel electron-beam lithography, in X-ray optics and in light optics.

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