scholarly journals The effect of phosphoric acid-acidified ammonium fluoride solution on human enamel.

1985 ◽  
Vol 35 (3) ◽  
pp. 330-344
Author(s):  
Toshisada YAMAMURA
Keyword(s):  
Phosphoric Acid ◽  
Ammonium Fluoride ◽  
Fluoride Solution ◽  
Human Enamel

Effect of Phosphoric Acid Pre-etching on Fatigue Limits of Self-etching Adhesives

2015 ◽  
Vol 40 (4) ◽  
pp. 379-395 ◽  
Author(s):  
T Takamizawa ◽  
WW Barkmeier ◽  
A Tsujimoto ◽  
DD Scheidel ◽  
RL Erickson ◽  
...  
Keyword(s):  
Phosphoric Acid ◽  
Fatigue Testing ◽  
Resin Composite ◽  
Metal Ring ◽  
Staircase Method ◽  
Shear Fatigue ◽  
Human Enamel ◽  
Tooth Surfaces ◽  
Post Hoc ◽  
Self Etch

SUMMARY The purpose of this study was to use shear bond strength (SBS) and shear fatigue limit (SFL) testing to determine the effect of phosphoric acid pre-etching of enamel and dentin prior to application of self-etch adhesives for bonding resin composite to these substrates. Three self-etch adhesives—1) G- ænial Bond (GC Corporation, Tokyo, Japan); 2) OptiBond XTR (Kerr Corp, Orange, CA, USA); and 3) Scotchbond Universal (3M ESPE Dental Products, St Paul, MN, USA)—were used to bond Z100 Restorative resin composite to enamel and dentin surfaces. A stainless-steel metal ring with an inner diameter of 2.4 mm was used to bond the resin composite to flat-ground (4000 grit) tooth surfaces for determination of both SBS and SFL. Fifteen specimens each were used to determine initial SBS to human enamel/dentin, with and without pre-etching with a 35% phosphoric acid (Ultra-Etch, Ultradent Products Inc, South Jordan, UT, USA) for 15 seconds prior to the application of the adhesives. A staircase method of fatigue testing (25 specimens for each test) was then used to determine the SFL of resin composite bonded to enamel/dentin using a frequency of 10 Hz for 50,000 cycles or until failure occurred. A two-way analysis of variance and Tukey post hoc test were used for analysis of SBS data, and a modified t-test with Bonferroni correction was used for the SFL data. Scanning electron microscopy was used to examine the area of the bonded restorative/tooth interface. For all three adhesive systems, phosphoric acid pre-etching of enamel demonstrated significantly higher (p<0.05) SBS and SFL with pre-etching than it did without pre-etching. The SBS and SFL of dentin bonds decreased with phosphoric acid pre-etching. The SBS and SFL of bonds using phosphoric acid prior to application of self-etching adhesives clearly demonstrated different tendencies between enamel and dentin. The effect of using phosphoric acid, prior to the application of the self-etching adhesives, on SBS and SFL was dependent on the adhesive material and tooth substrate and should be carefully considered in clinical situations.

High resolution surface analysis of Si roughening in dilute ammonium fluoride solution

2003 ◽  
Vol 540 ◽  
pp. 3-6 ◽  
Author(s):  
H.J Lewerenz ◽  
M Aggour ◽  
C Murrell ◽  
J Jakubowicz ◽  
M Kanis ◽  
...  
Keyword(s):  
High Resolution ◽  
Surface Analysis ◽  
Ammonium Fluoride ◽  
Fluoride Solution

Effects of Pulsed Nd:YAG Laser on Tensile Bond Strength and Caries Resistance of Human Enamel

2014 ◽  
Vol 39 (3) ◽  
pp. 273-282 ◽  
Author(s):  
X Wen ◽  
L Zhang ◽  
R Liu ◽  
M Deng ◽  
Y Wang ◽  
...  
Keyword(s):  
Phosphoric Acid ◽  
Bond Strength ◽  
Nd:Yag Laser ◽  
Acid Resistance ◽  
Enamel Surface ◽  
Acid Etching ◽  
Laser Parameter ◽  
Pulsed Nd:Yag Laser ◽  
Resistance Evaluation ◽  
Human Enamel

SUMMARY This study aims to evaluate the effects of pulsed Nd:YAG laser on the tensile bond strength (TBS) of resin to human enamel and caries resistance of human enamel. A total of 201 human premolars were used in this in vitro study. A flat enamel surface greater than 4 × 4 mm in area was prepared on each specimen using a low-speed cutting machine under a water coolant. Twenty-one specimens were divided into seven groups for morphology observations with no treatment, 35% phosphoric acid etching (30 seconds), and laser irradiation (30 seconds) of pulsed Nd:YAG laser with five different laser-parameter combinations. Another 100 specimens were used for TBS testing. They were embedded in self-cured acrylic resin and randomly divided into 10 groups. After enamel surface pretreatments according to the group design, resin was applied. The TBS values were tested using a universal testing machine. The other 80 specimens were randomly divided into eight groups for acid resistance evaluation. Scanning electron microscope (SEM) results showed that the enamel surfaces treated with 1.5 W/20 Hz and 2.0 W/20 Hz showed more etching-like appearance than those with other laser-parameter combinations. The laser-parameter combinations of 1.5 W/15 Hz and 1.5 W/20 Hz were found to be efficient for the TBS test. The mean TBS value of 14.45 ± 1.67 MPa in the laser irradiated group was significantly higher than that in the untreated group (3.48 ± 0.35 MPa) but lower than that in the 35% phosphoric acid group (21.50 ± 3.02 MPa). The highest mean TBS value of 26.64 ± 5.22 MPa was identified in the combination group (laser irradiation and then acid etching). Acid resistance evaluation showed that the pulsed Nd:YAG laser was efficient in preventing enamel demineralization. The SEM results of the fractured enamel surfaces, resin/enamel interfaces, and demineralization depths were consistent with those of the TBS test and the acid resistance evaluation. Pulsed Nd:YAG laser as an enamel surface pretreatment method presents a potential clinical application, especially for the caries-susceptible population or individuals with recently bleached teeth.

scholarly journals Effect of a self-etching primer and phosphoric acid etching on the bond strength of 4-META/MMA-TBB resin to human enamel

2015 ◽  
Vol 34 (2) ◽  
pp. 219-226 ◽  
Author(s):  
Hiroshi NOGAWA ◽  
Hiroyasu KOIZUMI ◽  
Osamu SAIKI ◽  
Haruto HIRABA ◽  
Mitsuo NAKAMURA ◽  
...  
Keyword(s):  
Phosphoric Acid ◽  
Bond Strength ◽  
Acid Etching ◽  
Human Enamel ◽  
Phosphoric Acid Etching

scholarly journals Porous Glass Treated with Ammonium Fluoride Solution

1989 ◽  
Vol 97 (1123) ◽  
pp. 245-250 ◽  
Author(s):  
Nobuo TAKUSAGAWA ◽  
Shinji YANAGIDA ◽  
Kunio KITAJIMA
Keyword(s):  
Porous Glass ◽  
Ammonium Fluoride ◽  
Fluoride Solution

Response of human enamel to topical application of ammonium fluoride

1971 ◽  
Vol 16 (10) ◽  
pp. 1173-IN9 ◽  
Author(s):  
V. Caslavska ◽  
F. Brudevold ◽  
V. Vrbic ◽  
E.C. Moreno
Keyword(s):  
Topical Application ◽  
Ammonium Fluoride ◽  
Human Enamel

Emission Spectrographic Analysis of Boron in 40% NH4F Solution

1974 ◽  
Vol 28 (4) ◽  
pp. 369-371 ◽  
Author(s):  
Carlo Grilletto
Keyword(s):  
Detection Limit ◽  
Reliable Method ◽  
Boron Content ◽  
Accurate Determination ◽  
Ammonium Fluoride ◽  
Spectrographic Analysis ◽  
Fluoride Solution ◽  
Spectrographic Method ◽  
Boron Level

This paper describes a reliable emission spectrographic method capable of quantitatively determining boron in the 0.5 to 50 ppm range. The detection limit for the method is 0.1 ppm. Previous to this report no reliable method was available for the accurate determination of boron in reagent 40% ammonium fluoride solution in the ppm range; consequently, no incoming inspection or manufacturer's certification was available for boron content. Analysis of representative ammonium fluoride samples shows that the boron level is less than 0.1 ppm, suggesting that this element may not be a major problem in ammonium fluoride reagent.

Surface analysis of the electropolishing layer on Si(111) in ammonium fluoride solution

2000 ◽  
Vol 45 (28) ◽  
pp. 4615-4627 ◽  
Author(s):  
H.J Lewerenz ◽  
H Jungblut ◽  
S Rauscher
Keyword(s):  
Surface Analysis ◽  
Ammonium Fluoride ◽  
Fluoride Solution

Microwave Reflectance Studies of Photoelectrochemical Kinetics at Semiconductor Electrodes. 2. Hydrogen Evolution at p-Si in Ammonium Fluoride Solution

2003 ◽  
Vol 107 (24) ◽  
pp. 5864-5870 ◽  
Author(s):  
Michael J. Cass ◽  
Noel W. Duffy ◽  
Laurence M. Peter ◽  
Stephen R. Pennock ◽  
Shin Ushiroda ◽  
...  
Keyword(s):  
Hydrogen Evolution ◽  
Ammonium Fluoride ◽  
Fluoride Solution ◽  
Semiconductor Electrodes
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