scholarly journals Optical Proximity Correction (OPC) Under Immersion Lithography

2018 ◽  
Author(s):  
Ahmed Awad ◽  
Atsushi Takahashi ◽  
Chikaaki Kodaman
Keyword(s):  
Optical Proximity Correction ◽  
Immersion Lithography

Localization Techniques on a 0.15um CMOS Device: Charge Pump Failure Analysis

2002 ◽  
Author(s):  
Hui Pan ◽  
Thomas Gibson
Keyword(s):  
Failure Analysis ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Electrical Characterization ◽  
Charge Pump ◽  
Front Side ◽  
Pump Failure ◽  
Electrical Failure ◽  
Optical Proximity Correction ◽  
A Charge

Abstract In recent years, there have been many advances in the equipment and techniques used to isolate faults. There are many options available to the failure analyst. The available techniques fall into the categories of electrical, photonic, thermal and electron/ion beam [1]. Each technique has its advantages and its limitations. In this paper, we introduce a case of successful failure analysis using a combination of several fault localization techniques on a 0.15um CMOS device with seven layers of metal. It includes electrical failure mode characterization, front side photoemission, backside photoemission, Focused Ion Beam (FIB), Scanning Electron Microscope (SEM) and liquid crystal. Electrical characterization along with backside photoemission proved most useful in this case as a poly short problem was found to be causing a charge pump failure. A specific type of layout, often referred to as a hammerhead layout, and the use of Optical Proximity Correction (OPC) contributed to the poly level shorts.

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

2007 ◽  
Author(s):  
Yoshiyuki Sekine ◽  
Miyoko Kawashima ◽  
Eiji Sakamoto ◽  
Keita Sakai ◽  
Akihiro Yamada ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography

scholarly journals Novel high-index resists for 193-nm immersion lithography and beyond

2007 ◽  
Author(s):  
Idriss Blakey ◽  
Lan Chen ◽  
Bronwin Dargaville ◽  
Heping Liu ◽  
Andrew Whittaker ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

Defect control of immersion lithography with top coat material

2005 ◽  
Author(s):  
T. Ando ◽  
T. Takayama ◽  
H. Tsuji ◽  
K. Ishizuka ◽  
M. Yoshida ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Defect Control ◽  
Coat Material

scholarly journals High Refractive Index Fluid for Next Generation ArF Immersion Lithography

2006 ◽  
Vol 19 (5) ◽  
pp. 641-646 ◽  
Author(s):  
Taiichi Furukawa ◽  
Katsuhiko Hieda ◽  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Kinji Yamada ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

Optical proximity correction of bit line pattern in DRAM devices

1996 ◽  
Author(s):  
Yongbeom Kim ◽  
Chang-Jin Sohn ◽  
Hoyoung Kang ◽  
Woo-Sung Han ◽  
Young-Bum Koh
Keyword(s):  
Line Pattern ◽  
Optical Proximity Correction

scholarly journals Numerical Investigations on Requirements for BARC Materials for Hyper NA Immersion Lithography

2005 ◽  
Vol 18 (5) ◽  
pp. 587-592 ◽  
Author(s):  
Nobuyuki Matsuzawa ◽  
Yoko Watanabe ◽  
Boontarika Thuunakart ◽  
Ken Ozawa ◽  
Yuko Yamaguchi ◽  
...  
Keyword(s):  
Numerical Investigations ◽  
Immersion Lithography
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