scholarly journals Spectroscopy in optical technology. III. Micro fabrication.

1988 ◽  
Vol 37 (3) ◽  
pp. 218-228
Author(s):  
Toyoki KITAYAMA
Keyword(s):  
Optical Technology ◽  
Micro Fabrication

New type electron gun with electrostatic and electromagnetic lenses

1978 ◽  
Vol 36 (1) ◽  
pp. 62-63
Author(s):  
T. Ichinokawa ◽  
H. Maeda
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Optimum Condition ◽  
Bias Voltage ◽  
Electron Gun ◽  
Charge Effect ◽  
Micro Fabrication ◽  
Maximum Brightness ◽  
New Type ◽  
The Ideal

I. IntroductionThermionic electron gun with the Wehnelt grid is popularly used in the electron microscopy and electron beam micro-fabrication. It is well known that this gun could get the ideal brightness caluculated from the Lengumier and Richardson equations under the optimum condition. However, the design and ajustment to the optimum condition is not so easy. The gun has following properties with respect to the Wehnelt bias; (1) The maximum brightness is got only in the optimum bias. (2) In the larger bias than the optimum, the brightness decreases with increasing the bias voltage on account of the space charge effect. (3) In the smaller bias than the optimum, the brightness decreases with bias voltage on account of spreading of the cross over spot due to the aberrations of the electrostatic immersion lens.In the present experiment, a new type electron gun with the electrostatic and electromagnetic lens is designed, and its properties are examined experimentally.

Interdisciplinary Survey on Nanocommunications-based Molecular, Electromagnetic and Optical Technology

2018 ◽  
Vol 27 (2) ◽  
pp. 183-211
Author(s):  
Fatma G. Hashad ◽  
S. El Rabaie ◽  
Ibrahim F. El Ashry ◽  
O. Zahran ◽  
Fathi E. Abd El Samie
Keyword(s):  
Optical Technology

High-resolution deep-UV laser mask repair based on near-field optical technology

1996 ◽  
Author(s):  
Klony S. Lieberman ◽  
Hanan Terkel ◽  
Michael Rudman ◽  
A. Ignatov ◽  
Aaron Lewis
Keyword(s):  
High Resolution ◽  
Near Field ◽  
Uv Laser ◽  
Optical Technology ◽  
Deep Uv

scholarly journals A Stochastic Model to Describe the Scattering in the Response of Polysilicon MEMS

2021 ◽  
Vol 2 (1) ◽  
pp. 95
Author(s):  
Luca Dassi ◽  
Marco Merola ◽  
Eleonora Riva ◽  
Angelo Santalucia ◽  
Andrea Venturelli ◽  
...  
Keyword(s):  
Silicon Film ◽  
Micro Fabrication ◽  
Micro Electro Mechanical Systems ◽  
Local Fluctuations ◽  
Stochastic Framework ◽  
On Line ◽  
Chip Testing ◽  
On Chip ◽  
Time Required ◽  
Polycrystalline Silicon Film

The current miniaturization trend in the market of inertial microsystems is leading to movable device parts with sizes comparable to the characteristic length-scale of the polycrystalline silicon film morphology. The relevant output of micro electro-mechanical systems (MEMS) is thus more and more affected by a scattering, induced by features resulting from the micro-fabrication process. We recently proposed an on-chip testing device, specifically designed to enhance the aforementioned scattering in compliance with fabrication constraints. We proved that the experimentally measured scattering cannot be described by allowing only for the morphology-affected mechanical properties of the silicon films, and etch defects must be properly accounted for too. In this work, we discuss a fully stochastic framework allowing for the local fluctuations of the stiffness and of the etch-affected geometry of the silicon film. The provided semi-analytical solution is shown to catch efficiently the measured scattering in the C-V plots collected through the test structure. This approach opens up the possibility to learn on-line specific features of the devices, and to reduce the time required for their calibration.

Fabrication of Three-Dimensional Micro-Structures with Two-Photon Absorption by Femtosecond Laser

2006 ◽  
Vol 532-533 ◽  
pp. 568-571
Author(s):  
Ming Zhou ◽  
Hai Feng Yang ◽  
Li Peng Liu ◽  
Lan Cai
Keyword(s):  
Photonic Crystal ◽  
Femtosecond Laser ◽  
Detection System ◽  
Three Dimensional ◽  
Photon Absorption ◽  
Micro Fabrication ◽  
Two Photon Absorption ◽  
Two Photon ◽  
Photo Polymerization ◽  
System A

The photo-polymerization induced by Two-Photon Absorption (TPA) is tightly confined in the focus because the efficiency of TPA is proportional to the square of intensity. Three-dimensional (3D) micro-fabrication can be achieved by controlling the movement of the focus. Based on this theory, a system for 3D-micro-fabrication with femtosecond laser is proposed. The system consists of a laser system, a microscope system, a real-time detection system and a 3D-movement system, etc. The precision of micro-machining reaches a level down to 700nm linewidth. The line width was inversely proportional to the fabrication speed, but proportional to laser power and NA. The experiment results were simulated, beam waist of 0.413μm and TPA cross section of 2×10-54cm4s was obtained. While we tried to optimize parameters, we also did some research about its applications. With TPA photo-polymerization by means of our experimental system, 3D photonic crystal of wood-pile structure twelve layers and photonic crystal fiber are manufactured. These results proved that the micro-fabrication system of TPA can not only obtain the resolution down to sub-micron level, but also realize real 3D micro-fabrication.

A New Specimen for Measuring the Interfacial Toughness of Al-0.5%Cu Thin Film on Si Substrate

2005 ◽  
Vol 297-300 ◽  
pp. 521-526
Author(s):  
Insu Jeon ◽  
Masaki Omiya ◽  
Hirotsugu Inoue ◽  
Kikuo Kishimoto ◽  
Tadashi Asahina
Keyword(s):  
Thin Film ◽  
The Finite Element Method ◽  
Si Substrate ◽  
Detailed Structure ◽  
Micro Fabrication ◽  
Interfacial Toughness ◽  
Linear Elastic ◽  
Elastic Fracture ◽  
Cu Thin Film ◽  
Research Show

A new specimen is proposed to measure the interfacial toughness between the Al-0.5%Cu thin film and the Si substrate. The plain and general micro-fabrication processes are sufficient to fabricate the specimen. With the help of the finite element method and the concepts of the linear elastic fracture mechanics, the detailed structure for this specimen is modeled and evaluated. The results obtained from this research show that the proposed specimen provides efficient and convenient method to measure the interfacial toughness between the Al-Cu thin film and the Si substrate.

Development of Membrane Micro Embossing (MeME) Process for Self-Supporting Polymer Membrane Microchannel

2005 ◽  
Author(s):  
Masashi Ikeuchi ◽  
Koji Ikuta
Keyword(s):  
Glass Transition ◽  
Transition Temperature ◽  
Polymer Membrane ◽  
Mold Surface ◽  
Thermoplastic Polymer ◽  
Master Mold ◽  
Thin Membrane ◽  
Micro Fabrication ◽  
Micro Scale ◽  
Planar Membrane

In this work, we have successfully fabricated self-supporting polymer membrane microchannels with width of 50μm, depth of 50μm, and wall thickness of ~5μm. To fabricate this self-supporting polymer membrane microchannel, we have developed novel micro fabrication process named “membrane micro embossing (MeME)”. In this process, a thin (~μm) thermoplastic polymer membrane set between a master mold and a deformable support substrate is heated to glass transition temperature, and pressed to fit the membrane onto the mold surface. By heat-sealing the embossed membrane with another planar membrane, we can fabricate sealed membrane microchannels. This membrane microchannel surrounded by only thin membrane walls will provide a powerful platform for micro-scale biological and chemical analysis.

Mechanical-free optical technology for nanostructures inspection

2014 ◽  
Author(s):  
Maxim V. Ryabko ◽  
Sergey N. Koptyaev ◽  
Alexander V. Shcherbakov ◽  
Alexey D. Lantsov ◽  
Sangyoon Oh
Keyword(s):  
Optical Technology
Sign in / Sign up

Export Citation Format

Share Document