PHOTOCATALYTIC DEGRADATION OF 2-CHLOROPHENOL USING TiO₂THIN FILMS PREPARED BY CHEMICAL VAPOR DEPOSITION AND ION BEAM SPUTTERING METHOD

2002 ◽  
Vol 7 (4) ◽  
pp. 227-237
Author(s):  
Oh-Jin Jung ◽  
Sam-Hyeok Kim ◽  
Ji-Eun Jo ◽  
Chul-Ho Hwang
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Photocatalytic Degradation ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

2006 ◽  
Vol 500 (1-2) ◽  
pp. 19-26 ◽  
Author(s):  
F. Gracia ◽  
F. Yubero ◽  
J.P. Holgado ◽  
J.P. Espinos ◽  
A.R. Gonzalez-Elipe ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Tio2 Thin Films

Graphitization of thin films formed by focused-ion-beam chemical-vapor-deposition

2009 ◽  
Vol 18 (2-3) ◽  
pp. 490-492 ◽  
Author(s):  
Kazuhiro Kanda ◽  
Noriko Yamada ◽  
Makoto Okada ◽  
Jun-ya Igaki ◽  
Reo Kometani ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor

Synthesizing Nanocrystalline Carbon Thin Films by Hot Filament Chemical Vapor Deposition and Controlling Their Microstructure

2002 ◽  
Vol 17 (7) ◽  
pp. 1820-1833 ◽  
Author(s):  
S. Gupta ◽  
B. R. Weiner ◽  
G. Morell
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Noble Gas ◽  
Ion Beam ◽  
Chemical Vapor ◽  
X Ray ◽  
Hot Filament ◽  
Methane Concentrations

Nanocrystalline carbon (n-C) thin films were deposited on Mo substrates using methane (CH4) and hydrogen (H2) by the hot-filament chemical vapor deposition (HFCVD) technique. Process parameters relevant to the secondary nucleation rate were systematically varied (0.3–2.0% methane concentrations, 700–900 °C deposition temperatures, and continuous forward and reverse bias during growth) to study the corresponding variations in film microstructure. Standard nondestructive complementary characterization tools such as scanning electron microscopy, x-ray diffraction, atomic force microscopy, Raman spectroscopy, and x-ray photoelectron spectroscopy were utilized to obtain a coherent and comprehensive picture of the microstructure of these films. Through these studies we obtained an integral picture of the material grown and learned how to control key material properties such as surface morphology (faceted versus evenly smooth), grain size (microcrystalline versus nanocrystalline), surface roughness (from rough 150 rms to smooth 70 rms), and bonding configuration (sp3 C versus sp2 C), which result in physical properties relevant for several technological applications. These findings also indicate that there exist fundamental differences between HFCVD and microwave CVD (MWCVD) for methane concentrations above 1%, whereas some similarities are drawn among films grown by ion-beam assisted deposition, HFCVD assisted by low-energy particle bombardment, and MWCVD using noble gas in replacement of traditionally used hydrogen.

scholarly journals Tin Oxide Thin Films Prepared by Ion Beam Induced Chemical Vapor Deposition

Shinku ◽  
2006 ◽  
Vol 49 (12) ◽  
pp. 780-781
Author(s):  
Yuka FUJIKAWA ◽  
Masato KIUCHI ◽  
Takaomi MATSUTANI ◽  
Takae TAKEUCHI
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Tin Oxide ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Oxide Thin Films

Effect of Annealing on Implanted Ga of Diamond-Like Carbon Thin Films Fabricated by Focused-Ion-Beam Chemical Vapor Deposition

2008 ◽  
Vol 47 (12) ◽  
pp. 9010-9012 ◽  
Author(s):  
Takahiro Nagata ◽  
Yoshiki Sakuma ◽  
Masamitsu Haemori ◽  
Kiyomi Nakajima ◽  
Reo Kometani ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Diamond Like Carbon ◽  
Carbon Thin Films
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