Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. I. Preparation and characterization of TiO2 thin films

1994 ◽  
Vol 12 (5) ◽  
pp. 2728-2732 ◽  
Author(s):  
D. Leinen ◽  
J. P. Espinós ◽  
A. Fernández ◽  
A. R. González‐Elipe
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Oxide Thin Films ◽  
Tio2 Thin Films

SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

2006 ◽  
Vol 500 (1-2) ◽  
pp. 19-26 ◽  
Author(s):  
F. Gracia ◽  
F. Yubero ◽  
J.P. Holgado ◽  
J.P. Espinos ◽  
A.R. Gonzalez-Elipe ◽  
...  
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Tio2 Thin Films

scholarly journals Tin Oxide Thin Films Prepared by Ion Beam Induced Chemical Vapor Deposition

Shinku ◽  
2006 ◽  
Vol 49 (12) ◽  
pp. 780-781
Author(s):  
Yuka FUJIKAWA ◽  
Masato KIUCHI ◽  
Takaomi MATSUTANI ◽  
Takae TAKEUCHI
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Tin Oxide ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Oxide Thin Films
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