Large Area Liquid Crystal Display for Automotive Application

1983 ◽  
Author(s):  
K. Fahrenschon ◽  
W. Wiemer
1980 ◽  
Author(s):  
Kenji Horikiri ◽  
Torahiko Ando ◽  
Hiroshi Yamane ◽  
Hirotsugu Arai

2010 ◽  
Vol 18 (12) ◽  
pp. 1084 ◽  
Author(s):  
Po-Wen Liu ◽  
Chen-Chu Tsai ◽  
Wei-Hsun Huang ◽  
Chao-Wen Chen ◽  
Cheng-Yi Wang ◽  
...  

1998 ◽  
Vol 508 ◽  
Author(s):  
Yuri. A. Bobrov ◽  
Sean M. Casey ◽  
Leonid. Y. Ignatov ◽  
Pavel I. Lazarev ◽  
Daniel Phillips ◽  
...  

AbstractWe have developed new polarizing coating materials and processes which enable the fabrication of polarizers for large-area liquid-crystal displays. The polarizing materials are novel discotic surfactants which self-assemble in aqueous solutions to provide a stable liquid-crystalline phase within a wide range of concentrations and temperatures. These lyotropic liquid crystals in an aqueous medium can be spread on a substrate surface by a variety of techniques including a knife-like doctor blade, a rolling cylinder, or a roll-to-roll method. Under the shearing force applied during deposition, the liquid crystals align on the substrate forming a dichroic polarizer. This alignment process allows continuous production of large-area polarizing films at low cost compared with the current technology that requires stretching of the films. Thin coatings can be applied to flexible plastic films, glass, or rigid plastic substrates. Direct coating of the polarizing material on glass eliminates several process steps in liquid-crystal display production since lamination of the polarizing film is no longer required. These new polarizing films have a high optical performance including a polarizing efficiency of above 98% and a dichroic ratio as high as 7.7.


1992 ◽  
Vol 31 (Part 1, No. 12B) ◽  
pp. 4559-4562 ◽  
Author(s):  
Yutaka Miyata ◽  
Mamoru Furuta ◽  
Tatsuo Yoshioka ◽  
Tetsuya Kawamura

1985 ◽  
Vol 49 ◽  
Author(s):  
J. Allison ◽  
D.P. Turner ◽  
D.C. Cousins

AbstractPrototype thin film transistors have previously been fabricated by r.f. magnetron sputtering of a-Si:H on to CVD Si02 using a crystalline silicon gate. These devices exhibited an on/off current ratio of four orders of magnitude for gate voltages as low as 10 volts. This demonstrated the suitability of the sputtered layer for liquid crystal display applications.The use of a crystalline substrate negates the advantages of using a thin film,such as large area capability and low cost, so we have turned our attention to the provision of a sputtered dielectric. Several candidate materials have been considered, including Si02, Si3N4, Ta205, AIN and Ti02. We present the characteristics of our first all-sputtered transistor utilising an Si02 gate,and assess the dielectric properties and potential of other materials, with emphasis on the silicon oxynitride system.


2010 ◽  
Vol 41 (1) ◽  
pp. 1663 ◽  
Author(s):  
Po-Wen Liu ◽  
Chen-Chu Tsai ◽  
Cheng-Han Lee ◽  
Wei-Hsun Huang ◽  
Chao-Wen Chen ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document