Characterization of the Fabrication Process of Rolled LTCC Structures

2012 ◽  
Vol 2012 (CICMT) ◽  
pp. 000251-000257
Author(s):  
Kelci Parrish ◽  
Jesse Taff ◽  
Mallory Yates ◽  
Derek Reis ◽  
Donald Plumlee

This work focuses on the fabrication and assembly of cylindrical plasma containment tubes using DuPont's 951 Low Temperature Co-fired Ceramics (LTCC) for use in miniature electrostatic thrusters. The use of LTCC allows for robustness post-firing yet flexibility in the “green” un-fired state. Some of the main advantages of this flexibility include the ability to stack or roll the LTCC sheets into various shapes as well as incorporating embedded electrical interconnections using silver paste on the rolled layers. The tube is used to contain argon plasma, which is generated by a spiral Inductively Coupled Plasma antenna and is also fabricated in LTCC. The tube also interfaces with two electrically biased grids on the opposite end, which accelerate the plasma out of the tube. These interfaces are highly dependent on the dimensions and tolerances of the containment tube. The development of the fabrication process will be presented for the incorporation of the tubes onto the base as a single structure. This includes constructing the antenna base, shaping the “rolled” LTCC containment tube using a jig and isostatic press, and integrating the tube and antenna base during the firing. Following the fabrication, measurements will be taken to determine the tube circularity and the hermeticity of the seal at the interface between the tube and the antenna base. The results will be presented and characterized to evaluate the effectiveness of the structure as well as the documentation of the development of a rolled LTCC tube structure integrated with a planar LTCC antenna base.

2020 ◽  
Author(s):  
Jing Ma ◽  
Yongqiang Zhao ◽  
Wen Liu ◽  
Fuhua Yang ◽  
Xiaodong Wang

Abstract GaAs nanostructures has attracted more and more attention due to its excellent properties such as increasing photon absorption. The fabrication process on GaAs substrate were rarely reported and most of the preparation processes are complex. Here, we reported a black GaAs fabrication process using a simple Inductively coupled plasma (ICP) etching process,with no extra lithography process. The fabricated sample has a low Reflectance value,close to zero. Besides, the black GaAs also displayed hydrophobic property, with a water contact angle (CA) of 125°. This kind of black GaAs etching process could be added to the fabrication workflow of photodetectors and solar cell devices to further improve their characteristics.


2013 ◽  
Vol 2013 (CICMT) ◽  
pp. 000137-000142
Author(s):  
Derek Reis ◽  
Jesse Taff ◽  
Donald Plumlee

This work focuses on the fabrication and assembly of miniature inductively-coupled plasma (ICP) electrostatic thrusters using DuPont's 951 Low Temperature Co-Fired Ceramics (LTCC). The use of LTCC allows for integration of electrical and fluidic features inside a hermetically sealed device that is resistant to plasma erosion. LTCC also allowed for the creation of cylindrical and planar structures which could be mated to form a single device. The thruster consists of a planar base, an antenna disc, and a plasma containment cylinder. The planar base contains internal fluid distribution channels as well as electrical interconnections. The antenna disc houses straight-through gas ports, electrical interconnects, as well as a planar spiral ICP antenna. The containment cylinder is used to contain argon plasma created by a radio frequency (RF) signal sent through the ICP antenna. The development of the fabrication process will be presented for the incorporation and alignment of all three LTCC components together to create a single thruster body. The results of the electrical and fluidic integration of the device will be evaluated and presented.


2011 ◽  
Vol 257 (11) ◽  
pp. 5052-5058 ◽  
Author(s):  
Abhijeet Kshirsagar ◽  
Pradeep Nyaupane ◽  
Dhananjay Bodas ◽  
S.P. Duttagupta ◽  
S.A. Gangal

2021 ◽  
Vol 16 (1) ◽  
Author(s):  
Jing Ma ◽  
Yongqiang Zhao ◽  
Wen Liu ◽  
Peishuai Song ◽  
Liangliang Yang ◽  
...  

AbstractGaAs nanostructures have attracted more and more attention due to its excellent properties such as increasing photon absorption. The fabrication process on GaAs substrate was rarely reported, and most of the preparation processes are complex. Here, we report a black GaAs fabrication process using a simple inductively coupled plasma etching process, with no extra lithography process. The fabricated sample has a low reflectance value, close to zero. Besides, the black GaAs also displayed hydrophobic property, with a water contact angle of 125°. This kind of black GaAs etching process could be added to the fabrication workflow of photodetectors and solar cell devices to further improve their characteristics.


2012 ◽  
Vol 10 (2) ◽  
pp. 321-329 ◽  
Author(s):  
Jesse Taff ◽  
Mallory Yates ◽  
Carl Lee ◽  
Sonya Shawver ◽  
Jim Browning ◽  
...  

2014 ◽  
Vol 29 (6) ◽  
pp. 1132-1137 ◽  
Author(s):  
Lucia D'Ulivo ◽  
Lu Yang ◽  
Yong-Lai Feng ◽  
John Murimboh ◽  
Zoltán Mester

Accurate quantitation and characterization of organometals are successfully achieved by splitting the gas chromatography (GC) flow to both an electron ionization mass spectrometer (EIMS) and an inductively coupled plasma mass spectrometer (ICPMS).


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